The 70th JSAP Spring Meeting 2023

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13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[16p-A403-1~20] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Thu. Mar 16, 2023 1:00 PM - 6:45 PM A403 (Building No. 6)

Kazuhiko Endo(Tohoku Univ.), Kimihiko Kato(AIST)

5:15 PM - 5:30 PM

[16p-A403-15] Step coverage of Al2O3 film by ALD using high purity ozone

〇Takayuki Hagiwara1, Soichiro Motoda1, Naoto Kameda1, Ken Nakamura2, Hidehiko Nonaka2 (1.MEIDEN NPI INC., 2.AIST)

Keywords:ALD, Purity ozone, Step coverage