The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[16p-A403-1~20] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Thu. Mar 16, 2023 1:00 PM - 6:45 PM A403 (Building No. 6)

Kazuhiko Endo(Tohoku Univ.), Kimihiko Kato(AIST)

3:00 PM - 3:15 PM

[16p-A403-7] Energy-efficient Annealing Process of HfO2-based Ferroelectric Capacitor using UV-LED for Green Manufacturing

Hirotaka Yamada1,2, Satoru Furue1, Takehiko Yokomori1, Yuki Itoya2, Takuya Saraya2, Toshiro Hiramoto2, Masaharu Kobayashi2,3 (1.Ushio Inc., 2.IIS, Univ. of Tokyo, 3.d.lab, Univ. of Tokyo)

Keywords:Ferroelectric capacitor, LED anneal

Crystallization of ferroelectric Hf0.5Zr0.5O2 (HZO) capacitors with TiN electrodes is demonstrated using ultraviolet (UV)-LED annealing process, for the first time. The ferroelectric characteristics obtained by this method are comparable to those achieved by conventional infrared (IR)-RTA process at 400℃ ~450℃. Since the absorptance of the ferroelectric films is highest in UV region, the UV-LED annealing process is promising to achieve much higher energy-efficient annealing process than the conventional IR-RTA method for green manufacturing.