The 70th JSAP Spring Meeting 2023

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Kazuhiro Karahashi(Osaka univ.), Sumiko Fujisaki(Hitachi, Ltd.)

4:30 PM - 4:45 PM

[17p-A205-14] Etching reactions of Si and SiO2 by tungsten fluoride ion injections

〇(M1)Shunta Kawabata1, Tomoko Ito1, Song-Yun Kang2, Dongkyu Lee2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Samsung Electronics)

Keywords:High Aspect Ratio Etching, Ion beam