[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-6] Modification of hydroxyl group on surface with water vapor plasma by direct.

〇Kohshi Taguchi¹, Kashiwagi Daiki¹, Noborio Kazuyuki¹, Yamahara Motohiro¹, Tomikawa Mina¹, Yamamura Akihiro¹ (1.SAKIGAKE-Semiconductor Co., Ltd.)

Keywords:plasma

Experiments were conducted to achieve surface modification of OH groups without the need for vaporization equipment by vaporizing a mixture of purified water and glycerol directly in a chamber.
The OH group modification was evaluated by checking whether SAMs could be formed.
When a plasma-irradiated glass slide was exposed to trimethoxy octylsilane vapor, a SAM was formed, suggesting that the OH group can be modified by directly vaporizing the mixture. The control of this process will be discussed on the day.