[B-2-1] Universal Model for Impurity Diffusion and Oxidation of Silicon

K. Taniguchi, Y. Shibata, C. Hamaguchi (1.Department of Electronics Engineering, Osaka University)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-2] A Composite lon-Implantation/Dopant Diffusion Simulation Involving Point Defect Kinetics and Its Application to Ultra Shallow Base Design

Takako K. OKADA, Koichi KATO (1.ULSI Research Center, Toshiba Corporation, 2.Research and Development Center, Toshiba Corporation)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-3] A Study of Nucleation and Grain Growth in Silicon Implanted a-Silicon Films

Shigeru Kambayashi, Shinji Onga, Ichiro Mizushima, Katsuhiko Higuchi, Hiroshi Kuwano (1.ULSI Research Center, Toshiba Corporation, 2.Faculty of Science and Technology, Keio University)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-4] Optimization of the Amorphous Layer Thickness and the Junction Depth on the Preamorphization Method for Shallow-Junction Formation

A. Tanaka, T. Yamaji, A. Uchiyama, T. Hayashi, T. Iwabuchi, S. Nishikawa (1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-5] Reduction of Thickness Secondary Defects in MeV Ion Implanted Silicon by Intrinsic Gettering

N. Shimizu, B. Mizuno, S. Akiyama, K. Tsuji, T. Ohzone (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-6] Chemical State and Diffusion Behavior of As in Arsenosilicate Glass (AsSG)

Yoshitaka TSUNASHIMA, Takako OKADA, Hideichi KAWAGUCHI, Shinji ONGA, Kikuo YAMABE (1.ULSI Research Center, TOSHIBA Co.)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-2-7] Reduction of Threading Dislocations and Oxide Precipitates in SIMOX Material

Mamoru Tomozane, H. Ming Liaw (1.Semiconductor Research and Development Laboratory Motorola, Inc.)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-3-1] Micromachining and Its Application for Pressure Sensors

Susumu SUGIYAMA, Isemi IGARASHI (1.Toyota Central Res. & Develop. Labs., Inc.)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-3-2] Integrated Mass Flow Controller by Micromachining of Silicon

Masayosi ESASHI, Akira NAKANO, Shuichi SHOJI (1.Department of Electronic Engineering Tohoku University)

1989 Conference on Solid State Devices and Materials |PDF Download

[B-4-1] Demands for Submicron MOSFET's and Nitrided Oxide Gate-Dielectrics

Takashi Hori (1.Basic Research Laboratory, Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1989 Conference on Solid State Devices and Materials |PDF Download