[D-1-4] Current Drive Silicidation Technology for High Speed Field Programmable Devices

H. Suzuki、G. S. Jong、M. Hirayama、T. Ohmi (1.Department of Electronic Engineering, Faculty of Engineering, Tohoku University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-1-1] Selective Aluminum Chemical Vapor Deposition Using DMEAA

S. C. Sun、M. H. Tsai、H. T. Chiu、S. Y. Yang (1.Department of Electronics Engineering & Institute of Electronics, National Nano Device Laboratory, Institute of Applied Chemistry Chiao Tung University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-1-2] Resistance Anomaly of Al/CVD-W Interconnects in Deep Sub-Micron Width

Mitsuru Sekiguchi、Toyokazu Fujii、Michinari Yamanaka、Masanori Fukumoto (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-1-3] TiN/TiSi2 Formation Using TiNx Layer and Its Feasibilities in ULSI

Jeong Soo Byun、Chang Reol Kim、Kwan Goo Rha、Jae Jeong Kim、Woo Shik Kim (1.Semiconductor Research Laboratory of GoldStar Electron Co. Ltd.)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-1-4] Low Energy Bias Sputtering Filling of SiO2 into High Aspect Ratio Trench Employing Axially Confined Helicon Wave Plasma

G. Sadakuni、Y. Kobayashi、H. Shindo、T. Fukazawa、H. Sakaue、S. Shingubara、Y. Horiike (1.Department of Electric and Electronic Engineering, Toyo University、2.Department of Electrical Engineering, Hiroshima University and、3.Department of Electrical Engineering, Fukuyama University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-1-5] Al-Reflow Process with a "Cap-Clamp" for Sub-Micron Contact Holes

G. H. Choi、C. S. Park、I. S. Park、S. I. Lee、S. T. Ahn、Y. K. Kim、R. Reynolds (1.Semiconductor R & D Center Samsung Electronics、2.Varian Associates)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-2-1] Ultra-Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation

Jinzo Watanabe、Yasuaki Kawai、Nobuhiro Konishi、Tadahiro Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-2-2] Study of Single Layer Thermal Oxide as Inter-Poly Dielectric for Next Generation Flash Memory

N. Shinmura、S. Sato、K. Hakozaki、K. Azuma、K. Iguchi、K. Sakiyama (1.VLSI Development Laboratories, IC Group, SHARP Corporation)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-2-3] A Novel Approach for Leakage Current Reduction of LPCVD Ta2O5 Films by Rapid Thermal N2O Annealing

S. C. Sun、T. F. Chen (1.Department of Electronics Engineering & Institute of Electronics National Nano Device Laboratory, Chiao Tung University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-3-1] Initial Stage of Oxidation of Hydrogen-Terminated Si(100)-2×1 Surface

T. Aiba、K. Yamauchi、Y. Shimizu、N. Tate、M. Katayama、T. Hattori (1.Musashi Institute of Technology、2.Shin-Etsu Handotai Co. Ltd.)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード