[A01-3pm] 19. Colloid and Interface Chemistry

[A01-3pm-07] Development of highly functional oriental lacquer for suppression of rash and improvement of light resistance

^○Masaki MATSUBARA^1,2, Tetsuo SATO¹, Akiko TOKUTAKE¹, Atsushi MURAMATSU², Kiyoshi KANIE² (1. National Institute of Technology, Sendai College, 2. IMRAM, Tohoku University)

[Lang.] Japanese

Keywords:Oriental Lacquer, Ultraviolet absorber, Photocatalysis, Urushiol