The 103rd CSJ Annual Meeting

Sessions

10. Organic Chemistry -Organometallic Compounds- » Oral B

Academic Program [Oral B]

[K404-1am] 10. Organic Chemistry -Organometallic Compounds-

Wed. Mar 22, 2023 9:00 AM - 11:40 AM K404 (K404, Lecture Hall Bldg. [4F])

Chair: Hiroshi Naka, Mamoru Ito

Break (10:20 AM - 10:40 AM)

Academic Program [Oral B]

[K404-1vn] 10. Organic Chemistry -Organometallic Compounds-

Wed. Mar 22, 2023 4:10 PM - 5:30 PM K404 (K404, Lecture Hall Bldg. [4F])

Chair: Kazuhiko Semba, Kei Muto

Academic Program [Oral B]

[K404-2am] 10. Organic Chemistry -Organometallic Compounds-

Thu. Mar 23, 2023 9:00 AM - 11:40 AM K404 (K404, Lecture Hall Bldg. [4F])

Chair: Koji Kubota, Sobi Asako

Break (10:20 AM - 10:40 AM)

11:20 AM - 11:40 AM

Pan Gao1, Julong Jiang2, Satoshi Maeda1,2, Koji Kubota1,3, Hajime Ito1,3 (1. Institute for Chemical Reaction Design and Discovery (WPI-ICReDD), Hokkaido University, 2. Department of Chemistry, Faculty of Science, Hokkaido University, 3. Division of Applied Chemistry, Graduate School of Engineering, Hokkaido University)

[Lang.] English

Academic Program [Oral B]

[K404-2pm] 10. Organic Chemistry -Organometallic Compounds-

Thu. Mar 23, 2023 1:00 PM - 3:40 PM K404 (K404, Lecture Hall Bldg. [4F])

Chair: Takuya Kochi, Yuichiro Mutoh

Break (2:20 PM - 2:40 PM)

Academic Program [Oral B]

[K404-3am] 10. Organic Chemistry -Organometallic Compounds-

Fri. Mar 24, 2023 9:00 AM - 11:20 AM K404 (K404, Lecture Hall Bldg. [4F])

Chair: Kenichi Michigami, Taiga Yurino

9:00 AM - 9:20 AM

Hiroki Ishikawa1, Taiga Yurino2,3, Ryo Komatsu2, Ming-Yuan Gao2, Noriyoshi Arai2, Taichiro Touge1, Kazuhiko Matsumura1, Takeshi Ohkuma2,3 (1. Takasago International corporation, 2. Division of Applied Chemistry, Faculty of Engineering, Hokkaido University, 3. Frontier Chemistry Center, Hokkaido University)

[Lang.] English

Break (10:00 AM - 10:20 AM)

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*** Web links for the hybrid program (Asian International Symposium, The Chemical Record Lecture, and CSJ Public Lecture only) will be displayed during the Annual Meeting.
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