Symposium(Oral presentation)

[29p-B8-1~10] Frontiers of process technology for Si-related thin films

Fri. Mar 29, 2013 1:30 PM - 5:45 PM B8 (K2 4F-1406)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[29p-B8-1] Bonded Hybrid Wafers and Their Applications

^○Yoshihiro Kubota¹, Yuji Tobisaka¹, Shoji Akiyama¹, Takeshi Suwa¹, Kazutoshi Nagata¹, Shigeru Konishi¹, Makoto Kawai¹ (Shin-Etsu Chemical Co.¹)

[29p-B8-2] Defect engineering in multicrystalline silicon during melt growth

^○Noritaka Usami¹ (IMR, Tohoku Univ.¹)

[29p-B8-3] Si thin films by solution process and their application for electronics devices

^○Tatsuya Shimoda^1,2,3, Takashi Masuda^1.2, Yasuo Matsuki^2,4 (JAIST¹, JST-ERATO², JST-ALCA³, JSR⁴)

[29p-B8-4] Metal-Induced Crystallization of SiGe on Insulator

^○Taizoh Sadoh¹, Jong-Hyeok Park^1,2, Masashi Kurosawa^1,2, Kaoru Toko^1,3, Masanobu Miyao¹ (Kyushu Univ.¹, JSPS², Univ. Tsukuba³)

[29p-B8-4.1] Break(15min)

[29p-B8-5] High Quality Silicon Thin-Film and High Performance Devices on Glass Substrate

^○Akito Hara¹, Kuninori Kitahara² (Tohoku Gakuin Univ.¹, Shimane Univ.²)

[29p-B8-6] Thickening of Si system materials by high speed sputtering epitaxy and its application to solar cells

^○wenchang yeh¹ (Shimane Univ.¹)

[29p-B8-7] Very High Speed Grain Growth of Amorphous Silicon Film Induced by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation

^○Shohei Hayashi^1,2, Yuji Fujita¹, Seiji Morisaki¹, Takahiro Kamikura¹, Muneki Akazawa¹, Kohei Sakaike¹, Seiichiro Higashi¹ (Hiroshima Univ.¹, JSPS Research Fellow DC²)

[29p-B8-8] △Behavior of Sputtering Gas in Si Films by Blue-Multi-Laser-Diode Annealing

^○Takuma Nishinohara¹, Satoshi Chinen¹, Tatsuya Okada¹, Takashi Noguchi¹ (Univ. of the Ryukyus¹)

[29p-B8-9] Low-temperature formation of poly-Ge_1-xSn_x by underwater laser annealing

^○Masashi Kurosawa^1,2, Noriyuki Taoka¹, Osamu Nakatsuka¹, Hiroshi Ikenoue³, Shigeaki Zaima¹ (Nagoya Univ.¹, JSPS², Kyushu Univ.³)

[29p-B8-10] Photon energy dependence of boron activation by soft X-ray irradiation

^○Akira Heya¹, Takuto Fukuoka¹, Naoto Matsuo¹, Kazuhiro Kanda², Takashi Noguchi³ (Dept. Mat. Sci. and Chem. Univ. of Hyogo¹, LASTI Univ. of Hyogo², The Univ. of Ryukyu³)

Sessions

Symposium » ・Frontiers of process technology for Si-related thin films