Regular sessions(Oral presentation)

[30a-B1-1~10] 7.2 Electron microscopes, evaluation, measurement and analysis

Sat. Mar 30, 2013 9:00 AM - 11:45 AM B1 (K2 3F-1301)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[30a-B1-1] A quantitative evaluation of alignment methods in electron tomography

^○Yoshihiro Midoh¹, Koji Nakamae¹ (Osaka Univ.¹)

[30a-B1-2] ▼Image Processing for Phase Imperfections in Electron Holography

^○（D）Wei Li¹, Takayoshi Tanji¹ (Nagoya University¹)

[30a-B1-3] Characteristics of an Optical Fiber Array Detector in the STEM

^○Takafumi Ishida¹, Tetsuji Kodama¹, Tadahiro Kawasaki², Keiko Ogai³, Takashi Ikuta⁴ (Meijo Univ.¹, Nagoya Univ.², APCO Ltd.³, Osaka Electro-Communication Univ.⁴)

[30a-B1-4] Visualization of Semiconducting p-n Junction by Newly-Developed Phase Imaging Method Based on Electron Diffraction Pattern

^○Jun Yamasaki¹, Keisuke Ohta², Shigeyuki Morishita², Hirokazu Sasaki³, Nobuo Tanaka¹ (Nagoya Univ.¹, Nagoya Univ.², Furukawa Electric Co., Ltd.³)

[30a-B1-5] Stacking faults at 3C-SiC/Si(001) studied by aberration-corrected TEM

^○Jun Yamasaki¹, Shin Inamoto², Yuki Nomura², Atsushi Ishida², Kensuke Akiyama³, Yasuo Hirabayashi³, Nobuo Tanaka¹ (Nagoya Univ.¹, Nagoya Univ.², Kanagawa Industrial Technology Center³)

[30a-B1-6] Observation of the crystalline structure distribution in Au-TiO₂ catalysts

^○Tomoki Akita¹, Masanori kohyama¹ (AIST UBIQEN¹)

[30a-B1-6.1] Break(15min)

[30a-B1-7] Measurement and simulation of fogging electron current in Scanning Electron Microscope (III)

^○（M1）Yasuhiro Ohara¹, Masaru Otani¹, Akira Osada¹, Masatoshi Kotera¹ (Osaka Inst. of Tech.¹)

[30a-B1-8] Measurement of Surface Potential distribution at an Insulator Film Produced by Electron Beam irradiation in Scanning Electron Microscope

^○（M1）Masaru Otani¹, Akira Osada¹, Yasuhiro Ohara¹, Kentaro Kumagai¹, Masatoshi Kotera¹ (Osaka Inst. of Tech.¹)

[30a-B1-9] Discharging characteristics of insulating film irradiated by electron beam

^○（B）Kentaro Kumagai¹, Suguru Ootani¹, Yasuhiro Ohara¹, Masatoshi Kotera¹ (Osaka Inst.¹)

[30a-B1-10] Aspect ratio dependence of a secondary electron yield for line pattern

^○Daisuke Bizen¹, Yasunari Sohda¹, Hideyuki Kazumi² (Hitachi Central Research Lab.¹, Hitachi High-Technologies Corp.²)

Sessions

07. Beam Technology and Nanofabrication » 7.2 Electron microscopes, evaluation, measurement and analysis