The 63rd JSAP Spring Meeting, 2016

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13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sun. Mar 20, 2016 1:45 PM - 6:45 PM S423 (S4)

Seiichiro Higashi(Hiroshima Univ.), Akito Hara(Tohoku Gakuin Univ.)

2:00 PM - 2:15 PM

[20p-S423-2] Crystallization and Activation of P+ dope a-Ge film by Atmospheric Pressure Micro-Thermal-Plasma-Jet

〇Hiromu Harada2, Nakatani Taichi1, Shin Ryota1, Higashi Seiichiro1 (1.AdSM, 2.Hiroshima Univ.)

Keywords:Atmospheric Pressure Micro-Thermal-Plasma-Jet,Ge film