Oral presentation

[7a-A413-1~9] 8.1 Plasma production and control

Thu. Sep 7, 2017 9:00 AM - 11:30 AM A413 (413)

Akimitsu Hatta(Kochi Univ. of Tech.)

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9:00 AM - 9:15 AM

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

〇Yuto Tsuda¹, Takuto Watanabe¹, Koji Onishi¹, Tatsuto Takeda¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka univ., 2.Toyo univ., 3.NIRS)

9:15 AM - 9:30 AM

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

〇Koji Onishi¹, Yuto Tsuda¹, Takuto Watanabe¹, Tatsuto Takeda¹, Kouta Hamada¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

9:30 AM - 9:45 AM

[7a-A413-3] The critical condition of electron cyclotron resonance plasma by using 1.30/2.45GHz-band wireless microwaves source under extremely power

〇Takuto Watanabe¹, tsuda yuto¹, onishi koji¹, hamada kota¹, takeda tatsuto¹, kato yushi¹ (1.Osaka Univ.)

9:45 AM - 10:00 AM

[7a-A413-4] Enhanced production of electron cyclotron resonance plasma by plate-tuner

〇Kota Hamada¹, Takuto Watanabe¹, Yuto Tsuda¹, Koji Onishi¹, Tatsuto Takeda¹, Yushi Kato¹ (1.Osaka Univ.)

10:00 AM - 10:15 AM

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams

〇Tatsuto Takeda¹, Yuto Tsuda¹, Takuto Watanabe¹, Koji Onishi¹, Kouta Hamada¹, Yasutaka Inanaga², Yushi Kato¹ (1.Osaka Univ., 2.Mitsubishi Electric)

10:30 AM - 10:45 AM

△ [7a-A413-6] Slow Rotation of Microwave Plasma by Amplitude Modulation

〇(M2)Masaya Hotta¹, Daisuke Ogawa¹, Keiji Nakamura¹, Soonam Park², Dima Lubomirsky², Satoru Kobayashi², Hideo Sugai³ (1.Chubu Univ., 2.Applied Materials, 3.NISRI)

10:45 AM - 11:00 AM

[7a-A413-7] Electromagnetic field simulation of power absorption by slot-excited atmospheric-pressure microwave plasma

〇Haruka Suzuki¹, Yosuke Koike¹, Yuto Tamura¹, Yoshiki Baba¹, Hirotaka Toyoda¹ (1.Nagoya Univ.)

11:00 AM - 11:15 AM

[7a-A413-8] Power absorption mechanism in atmospheric-pressure microwave line plasma

〇Yuto Tamura¹, Yosuke Koike¹, Haruka Suzuki¹, Hirotaka Toyoda¹ (1.Nagoya Univ.)

11:15 AM - 11:30 AM

△ [7a-A413-9] Relationship between density of molecular nitrogen in the metastable A3Σu+ state and temperature of discharge tube in a remote nitrogen plasma source

〇masaharu shimabayashi¹, Kazuaki Kurihara², Koichi Sasaki¹ (1.Hokkaido Univ., 2.Toshiba/Imec)

Oral presentation

[7p-A413-1~9] 8.1 Plasma production and control

Thu. Sep 7, 2017 4:00 PM - 6:30 PM A413 (413)

Hiroshi Akatsuka(Titech)

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4:00 PM - 4:15 PM

[7p-A413-1] Simulation of Atmospheric-pressure Glow Plasma Induced by Dielectric-Barrier Discharge

〇LIZHU TONG¹ (1.Keisoku Eng. Sys.)

4:15 PM - 4:30 PM

[7p-A413-2] Simulation of Non-Equilibrium Atmospheric Pressure He/H₂/CH₄ Plasmas for Carbon Thin Films Deposition

〇(M2)Kazuma Ohki¹, Akinori Oda¹, Takayuki Ohta², Hiroyuki Kousaka³ (1.Chiba inst. Technol., 2.Meijo Univ., 3.Gifu Univ.)

4:30 PM - 4:45 PM

[7p-A413-3] Simulations of jet plasma for sterilization combining gas flow and plasma generation

〇Shigeyuki Takagi¹, Daisuke Nose¹ (1.Tokyo Univ. of Tech.)

4:45 PM - 5:00 PM

△ [7p-A413-4] Effect of applied frequency on the reactive species and chemical species in liquid produced by low frequency atmospheric pressure plasma jet

〇Rui Chiba¹, Kyouhei Harashima¹, Yuuichi Tamura¹, Tatsuo Ishijima¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹ (1.Kanazawa Univ.)

5:00 PM - 5:15 PM

[7p-A413-5] VUV spectroscopy of ultrapure atmospheric pressure Helium plasmas

〇Katsuhisa Kitano¹, Mika Yoshida¹, Mitsutoshi Aramaki², Kei Shinada³, Satoshi Matsuoka³ (1.Eng. Osaka Univ., 2.Nihon Univ., 3.Shimadzu Co.)

5:30 PM - 5:45 PM

△ [7p-A413-6] Extension of Atmospheric Pressure Plasma Jet Length by Laminar Flow Effect

〇Hideki Yajima¹, Kotaro Ogawa², Hiroshi Furuta², Akimitsu Hatta² (1.ORC Manufacturing, 2.Kochi Univ. Technol.)

5:45 PM - 6:00 PM

△ [7p-A413-7] Discharge properties of the nonequilibrium atmospheric pressure plasma source

〇(M1)Kaede Katsuno¹, Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Hiroshi Hashizume¹, Hiromasa Tanaka¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

6:00 PM - 6:15 PM

△ [7p-A413-8] Production of water vapor microwave plasma in the space shielded by water flow

〇Hikaru Senba¹, Yosuke Koike¹, Haruka Suzuki¹, Hirotaka Toyoda¹ (1.Nagoya Univ.)

6:15 PM - 6:30 PM

[7p-A413-9] High Power Nitrogen-Boosted Atmospheric Pressure Thermal-Plasma-Jet

〇Hiroaki Hanafusa¹, Ryosuke Nakashima¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

Poster presentation

[7p-PA3-1~8] 8.1 Plasma production and control

Thu. Sep 7, 2017 1:30 PM - 3:30 PM PA3 (P)

△：奨励賞エントリー
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1:30 PM - 3:30 PM

[7p-PA3-1] Development of a desktop-sized electron cyclotron resonance ion source

〇Tatsuei Yamazaki¹, Yodel Okazaki¹, Hiroya Uyama¹, Toyohisa Asaji¹, Takeshi Hitobo² (1.NIT, Toyama Coll., 2.Tateyama Machine Co.)

1:30 PM - 3:30 PM

[7p-PA3-2] Design of rotary-typed magnetron sputtering device for effective utilization of thin film material target

〇Yutarou Nakamura¹, Yasunori Ohtsu¹ (1.Saga Univ.)

1:30 PM - 3:30 PM

[7p-PA3-3] Development of RF magnetized hollow discharge electrode for low-pressure high-density plasma production

〇Kazuki Aso¹, Yasunori Ohtsu¹ (1.Saga Univ.)

1:30 PM - 3:30 PM

[7p-PA3-4] Influence of Xenon Argon Mixing Ratio on Generating Conditions of Laser Sustained Plasma

〇Makoto Matsui¹, Takahiro Ono¹, Tomoki Kamei¹ (1.Shizuoka Univ.)

1:30 PM - 3:30 PM

△ [7p-PA3-5] Memory Effect on Extraction of an Aluminum-Nitride Ion Beam from a Magnetron Sputter type Ion Source

〇Kentaro Yoshioka¹, Takahiro Kenmotsu², Motoi Wada¹ (1.Sci. Eng. , Doshisha Univ., 2.Med. Sci. , Doshisha Univ.)

1:30 PM - 3:30 PM

△ [7p-PA3-6] Simulation of Inductively-Coupled-Plasma Ignition with Capacitive Coupling

〇(M2)Makato Moriyama¹, Ivan Ganachev^1,2, Keiji Nakamura¹ (1.Chubu Univ., 2.Shibaura Mechatronics)

1:30 PM - 3:30 PM

[7p-PA3-7] Development of a Duoplasmatron Type Plasma Cathode for Sheet Plasma Production

〇Ryo Emura¹, Mamiko Sasao², Beverly Suarez¹, Motoi Wada¹ (1.Doshisha Univ., 2.Office of R&D promotion Doshisha Univ.)

1:30 PM - 3:30 PM

▲ [7p-PA3-8] Ignition Characteristics of Atmospheric 13.56 MHz RF Inductively Coupled Plasma

〇(D)JoeyKim Tumbali Soriano¹, Motoi Wada¹ (1.Graduate School of Sci. and Eng., Doshisha Univ.)

Sessions

8 Plasma Electronics » 8.1 Plasma production and control

[7a-A413-1~9] 8.1 Plasma production and control

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

[7a-A413-3] The critical condition of electron cyclotron resonance plasma by using 1.30/2.45GHz-band wireless microwaves source under extremely power

[7a-A413-4] Enhanced production of electron cyclotron resonance plasma by plate-tuner

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams

△ [7a-A413-6] Slow Rotation of Microwave Plasma by Amplitude Modulation

[7a-A413-7] Electromagnetic field simulation of power absorption by slot-excited atmospheric-pressure microwave plasma

[7a-A413-8] Power absorption mechanism in atmospheric-pressure microwave line plasma

△ [7a-A413-9] Relationship between density of molecular nitrogen in the metastable A3Σu+ state and temperature of discharge tube in a remote nitrogen plasma source

[7p-A413-1~9] 8.1 Plasma production and control

[7p-A413-1] Simulation of Atmospheric-pressure Glow Plasma Induced by Dielectric-Barrier Discharge

[7p-A413-2] Simulation of Non-Equilibrium Atmospheric Pressure He/H₂/CH₄ Plasmas for Carbon Thin Films Deposition

[7p-A413-3] Simulations of jet plasma for sterilization combining gas flow and plasma generation

△ [7p-A413-4] Effect of applied frequency on the reactive species and chemical species in liquid produced by low frequency atmospheric pressure plasma jet

[7p-A413-5] VUV spectroscopy of ultrapure atmospheric pressure Helium plasmas

△ [7p-A413-6] Extension of Atmospheric Pressure Plasma Jet Length by Laminar Flow Effect

△ [7p-A413-7] Discharge properties of the nonequilibrium atmospheric pressure plasma source

△ [7p-A413-8] Production of water vapor microwave plasma in the space shielded by water flow

[7p-A413-9] High Power Nitrogen-Boosted Atmospheric Pressure Thermal-Plasma-Jet

[7p-PA3-1~8] 8.1 Plasma production and control

[7p-PA3-1] Development of a desktop-sized electron cyclotron resonance ion source

[7p-PA3-2] Design of rotary-typed magnetron sputtering device for effective utilization of thin film material target

[7p-PA3-3] Development of RF magnetized hollow discharge electrode for low-pressure high-density plasma production

[7p-PA3-4] Influence of Xenon Argon Mixing Ratio on Generating Conditions of Laser Sustained Plasma

△ [7p-PA3-5] Memory Effect on Extraction of an Aluminum-Nitride Ion Beam from a Magnetron Sputter type Ion Source

△ [7p-PA3-6] Simulation of Inductively-Coupled-Plasma Ignition with Capacitive Coupling

[7p-PA3-7] Development of a Duoplasmatron Type Plasma Cathode for Sheet Plasma Production

▲ [7p-PA3-8] Ignition Characteristics of Atmospheric 13.56 MHz RF Inductively Coupled Plasma

Authentication