The 66th JSAP Spring Meeting, 2019

Presentation information

Symposium (Oral)

Symposium » Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

[10p-W922-1~8] Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

Sun. Mar 10, 2019 1:30 PM - 5:50 PM W922 (Multi-Purpose Digital Hall)

Masayuki Imaizumi(Mitsubishi Electric), Tohru Oka(Toyoda Gosei)

2:30 PM - 3:00 PM

[10p-W922-3] Ion Implantation into SiC and Device Applications

Tsunenobu Kimoto1 (1.Kyoto Univ.)

Keywords:semiconductor, SiC, ion implantation

Silicon carbide (SiC) is a wide bandgap semiconductor suitable for high-voltage and low-loss power devices. In this paper, fundamentals of ion implantation into SiC, its physical understanding, device applications, and remaining issues are presented.