Oral presentation

[24p-D114-1~11] 8.3 Plasma nanotechnology

Thu. Mar 24, 2022 1:00 PM - 4:15 PM D114 (D114)

Takeshi Kitajima(National Defence Academy), Manabu Tanaka(Kyushu Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:00 PM - 1:30 PM

[24p-D114-1] [INVITED] Plasma CVD synthesis of a-SiC semiconductor nanoparticles and its application to photocatalysts for H₂ evolution

〇Kensuke Honda¹ (1.Grad. Sch. Sci. Technol. Innov., Yamaguchi Univ.)

1:30 PM - 1:45 PM

[24p-D114-2] Surface modification of C₃N₄ by solution plasma and durability improvement of photocatalytic CO₂ reduction in hybrid with RuRu supramolecular photocatalyst

〇Noritaka Sakakibara¹, Mitsuhiko Shizuno¹, Tomoki Kanazawa², Kosaku Kato³, Akira Yamakata³, Shunsuke Nozawa², Tsuyohito Ito⁴, Kazuo Terashima⁴, Kazuhiko Maeda¹, Osamu Ishitani¹ (1.Tokyo Tech., 2.KEK, 3.TTI, 4.The Univ. of Tokyo)

1:45 PM - 2:00 PM

[24p-D114-3] Control of Particle Size Distribution of Nanoparticles Synthesized by Modulated Tandem Induction Thermal Plasmas with Different Modulation Waveforms

〇Yasunori Tanaka¹, Ryudai Furukawa¹, Yurina Nagase¹, Tomoya Fuwa¹, Yusuke Nakano¹, Tatsuo Ishijima¹, Shiori Sueyasu², Shu Watanabe², Keitaro Nakamura² (1.Kanazawa Univ., 2.Nisshin Seifun Gr.)

2:00 PM - 2:15 PM

[24p-D114-4] Synthesis of Double-Perovskite Li₃La₃W₂O₁₂ Nanoparticles by Induction Thermal Plasma

〇Manabu Tanaka¹, Byeong-Il Min¹, Takayuki Watanabe¹ (1.Kyushu Univ.)

2:15 PM - 2:30 PM

▼ [24p-D114-5] Surface modification of GaN/GaAs/Si by Ar plasma irradiation with radio frequency
biasing for optical applications

〇(P)Quan Shi¹, Hiyori Uehara², Ryo Yasuhara¹, Noriyasu Ohno³, Hiyori Uehara¹ (1.NIFS, 2.IMaSS, Nagoya Univ., 3.Nagoya Univ.)

2:45 PM - 3:00 PM

[24p-D114-6] Analysis of three-dimensional structurers of carbon nanowalls grown by a radical-injection plasma-enhanced chemical vapor deposition system

〇Hiroki Kondo¹, Atsushi Ozaki², Takayoshi Tsutsumi¹, Makoto Sekine¹, Kenji Ishikawa¹, Masaru Hori¹, Mineo Hiramatsu³ (1.Nagoya Univ. Low-temp. Plasma, 2.Nagoya Univ. Eng., 3.Meijo Univ. Sci.Eng.)

3:00 PM - 3:15 PM

△ [24p-D114-7] Surface potential control of carbon nanowalls template for highly efficient exosome analysis

〇(M1)Takumi Hashimoto¹, Hiroki Kondo², Hiromasa Tanaka², Kenji Ishikawa², Takayoshi Tsutsumi², Makoto Sekine², Takao Yasui¹, Yoshinobu Baba¹, Mineo Hiramatsu³, Masaru Hori² (1.Nagoya Univ. Eng., 2.Nagoya Univ. Center for Low-temperature Plasma Sciences, 3.Meijo Univ.)

3:15 PM - 3:30 PM

△ [24p-D114-8] Effect of ion irradiation angle on oriented growth of carbon nanowalls in plasma-enhanced chemical vapor deposition

〇(M1)Shintaro Iba¹, Hiroki Kondou², Kenji Ishikawa², Takayoshi Tsutsumi², Mineo Hiramatsu³, Makoto Sekine², Masaru Hori² (1.Nagoya Univ. Eng., 2.Nagoya Univ. Center for Low-temperature Plasma Sciences, 3.Meijo Univ.)

3:30 PM - 3:45 PM

△ [24p-D114-9] Composites of low-covered polyrotaxane and plasma modified inorganic particle

〇(M1C)Naoto Takagi¹, Kenichi Inoue^1,2, Shota Ando¹, Koichi Mayumi³, Hitoshi Muneoka¹, Yoshiki Shimizu², Tsuyohito Ito^1,2, Kohzo Ito¹, Kazuo Terashima^1,2 (1.UTokyo FS, 2.AIST, 3.UTokyo ISSP)

3:45 PM - 4:00 PM

[24p-D114-10] Effects of gas pressure and substrate position on deposition characteristics of a-C:H films deposited by plasma CVD method

〇(B)Shinjiro Ono¹, Daichi Yoshikawa¹, Sung Hwa Hwang¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Naoto Yamashita¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹, Jun Seok Oh³, Susumu Takabayashi⁴, Tatsuyuki Nakatani⁵ (1.Kyushu Univ., 2.NINS, 3.Osaka City Univ., 4.Ariake College, 5.Okayama Univ. Sci.)

4:00 PM - 4:15 PM

[24p-D114-11] Plasma Functionalization on Multi-walled Carbon Nanotubes — Analysis of Gas-Phase Species to Modify Isocyanate Groups —

〇DAISUKE OGAWA¹, KEIJI NAKAMURA¹ (1.Chubu University)

Sessions

8 Plasma Electronics » 8.3 Plasma nanotechnology

[24p-D114-1~11] 8.3 Plasma nanotechnology

[24p-D114-1] [INVITED] Plasma CVD synthesis of a-SiC semiconductor nanoparticles and its application to photocatalysts for H₂ evolution

[24p-D114-2] Surface modification of C₃N₄ by solution plasma and durability improvement of photocatalytic CO₂ reduction in hybrid with RuRu supramolecular photocatalyst

[24p-D114-3] Control of Particle Size Distribution of Nanoparticles Synthesized by Modulated Tandem Induction Thermal Plasmas with Different Modulation Waveforms

[24p-D114-4] Synthesis of Double-Perovskite Li₃La₃W₂O₁₂ Nanoparticles by Induction Thermal Plasma

▼ [24p-D114-5] Surface modification of GaN/GaAs/Si by Ar plasma irradiation with radio frequency
biasing for optical applications

[24p-D114-6] Analysis of three-dimensional structurers of carbon nanowalls grown by a radical-injection plasma-enhanced chemical vapor deposition system

△ [24p-D114-7] Surface potential control of carbon nanowalls template for highly efficient exosome analysis

△ [24p-D114-8] Effect of ion irradiation angle on oriented growth of carbon nanowalls in plasma-enhanced chemical vapor deposition

△ [24p-D114-9] Composites of low-covered polyrotaxane and plasma modified inorganic particle

[24p-D114-10] Effects of gas pressure and substrate position on deposition characteristics of a-C:H films deposited by plasma CVD method

[24p-D114-11] Plasma Functionalization on Multi-walled Carbon Nanotubes — Analysis of Gas-Phase Species to Modify Isocyanate Groups —

Authenticate

Sessions

8 Plasma Electronics » 8.3 Plasma nanotechnology

[24p-D114-1~11] 8.3 Plasma nanotechnology

[24p-D114-1] [INVITED] Plasma CVD synthesis of a-SiC semiconductor nanoparticles and its application to photocatalysts for H2 evolution

[24p-D114-2] Surface modification of C3N4 by solution plasma and durability improvement of photocatalytic CO2 reduction in hybrid with RuRu supramolecular photocatalyst

[24p-D114-3] Control of Particle Size Distribution of Nanoparticles Synthesized by Modulated Tandem Induction Thermal Plasmas with Different Modulation Waveforms

[24p-D114-4] Synthesis of Double-Perovskite Li3La3W2O12 Nanoparticles by Induction Thermal Plasma

▼ [24p-D114-5] Surface modification of GaN/GaAs/Si by Ar plasma irradiation with radio frequencybiasing for optical applications

[24p-D114-6] Analysis of three-dimensional structurers of carbon nanowalls grown by a radical-injection plasma-enhanced chemical vapor deposition system

△ [24p-D114-7] Surface potential control of carbon nanowalls template for highly efficient exosome analysis

△ [24p-D114-8] Effect of ion irradiation angle on oriented growth of carbon nanowalls in plasma-enhanced chemical vapor deposition

△ [24p-D114-9] Composites of low-covered polyrotaxane and plasma modified inorganic particle

[24p-D114-10] Effects of gas pressure and substrate position on deposition characteristics of a-C:H films deposited by plasma CVD method

[24p-D114-11] Plasma Functionalization on Multi-walled Carbon Nanotubes — Analysis of Gas-Phase Species to Modify Isocyanate Groups —

Authenticate

[24p-D114-1] [INVITED] Plasma CVD synthesis of a-SiC semiconductor nanoparticles and its application to photocatalysts for H₂ evolution

[24p-D114-2] Surface modification of C₃N₄ by solution plasma and durability improvement of photocatalytic CO₂ reduction in hybrid with RuRu supramolecular photocatalyst

[24p-D114-4] Synthesis of Double-Perovskite Li₃La₃W₂O₁₂ Nanoparticles by Induction Thermal Plasma

▼ [24p-D114-5] Surface modification of GaN/GaAs/Si by Ar plasma irradiation with radio frequency
biasing for optical applications