The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Kazuhiro Karahashi(Osaka univ.), Sumiko Fujisaki(Hitachi, Ltd.)

1:45 PM - 2:00 PM

[17p-A205-4] Technology for long-term retention of surface modification properties by plasma.

Kohshi Taguchi1, Motohiro Yamahara1, Mina Tomikawa1, Kazuyuki Noborio1 (1.SAKIGAKE-Semiconductor Co., Ltd.)

Keywords:Plasma, SAM, Hydrophilic

Traditionally, SAMs (Self-Assembled Monolayer; self-assembled monolayer) have been formed mainly by a wet process after activation of the sample surface by plasma or other means. We have developed a technology that enables the formation of SAMs in a short time and the long-term retention of surface modification properties through the application of plasma.