[F] 6. 固体表面・界面の科学と技術

[F-40] Chiral Nano-Patterning of Polystyrene Thin Films by Colloidal Lithography and Their Optical Properties

*Rino Kaneko¹, KeHsuan Wang², Yoshiro Imura², Takeshi Kawai² (1. Graduate School of Engineering, Tokyo University of Science(Japan), 2. Faculty of Engineering, Tokyo University of Science(Japan))

Keywords:Colloidal lithography, Optical properties, UV light, Polystyrene thin film