Anti-readsorption of Photoresist with Pluronic Surfactant: Effects of Solvent Composition

Yasufumi Nagai

Presentation information

Regular Session (Oral)

3. Organized Thin Films

[1C09-12] Science and technology of organized thin films

Wed. Sep 15, 2021 1:00 PM - 2:20 PM Room C (Room C)

Chair:Hiroki Matsubara(Hiroshima University), Atsuhiro Fujimori(Saitama University)

1:20 PM - 1:40 PM

[1C10] Anti-readsorption of Photoresist with Pluronic Surfactant: Effects of Solvent Composition

*Yasufumi Nagai¹, Hidekazu Oohinata², Masaaki Akamatsu¹, Kenichi Sakai^1,3, Hideki Sakai^1,3 (1. Faculty of Sci. and Tech., Tokyo Univ. of Science (Japan), 2. Nomura Micro Science Co., Ltd. (Japan), 3. Research Institute for Sci. and Tech., Tokyo Univ. of Science (Japan))

Keywords:Alkylene carbonate, Photoresist, Pluronic surfactant, Quartz crystal microbalance with dissipation monitoring

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