[A04-1am] 07. 無機化学

[A04-1am-06] Selective fabrication of Ca₂NH epitaxial thin films using magnetron sputtering system

^○Seoungmin Chon¹, Shigeru Kobayashi¹, Kazunori Nishio¹, Ryota Shimizu^1,2, Taro Hitosugi¹ (1. Department of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan , 2. PRESTO, Japan Science and Technology Agency, Saitama, 332-0012, Japan)

［言語］英語

キーワード： thin films, Metal nitride hydride