The 63rd JSAP Spring Meeting, 2016

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Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sat. Mar 19, 2016 9:00 AM - 12:30 PM S423 (S4)

Minoru Sasaki(Toyota Tech. Inst.), Takaaki Tsunomura(Tokyo Electron Ltd.)

9:00 AM - 9:15 AM

[19a-S423-1] Fabrication and Characterization of SOI-CMOS Integrated Circuits by Minimal Fab and Mega Fab Hybrid Process

〇Yongxun Liu1, Sommawan Khumpuang1,2, Masayoshi Nagao1, Hara Shiro1,2 (1.AIST, 2.MINIMAL)

Keywords:Minimal,SOI-CMOS,Ring Oscillator