Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Sun. Sep 12, 2021 9:00 AM - 11:30 AM N102 (Oral)
Mitsuhiro Omura(Kioxia corporation), Kazuo Takahashi(Kyoto Inst. of Tech.)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
9:00 AM - 9:15 AM
〇Iori Hirashima1, Hiroshi Kuwahata1 (1.Tokai Univ.)
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9:15 AM - 9:30 AM
〇Rikyu Minami1, Kenji Ishikawa1, Takayoshi Tsutsumi1, Hiroki Kondo1, Makoto Sekine1, Osamu Oda1, Masaru Hori1 (1.Nagoya Univ.)
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9:30 AM - 9:45 AM
〇(M2)Taito Yoshie1, Takayoshi Tsutsumi2, Kenji Ishikawa2, Masaru Hori2 (1.Nagoya Univ. Eng., 2.Center for Low-temperature Plasma Sciences, Nagoya Univ.)
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9:45 AM - 10:00 AM
〇(D)Charisse Cagomoc1, Michiro Isobe1, Eric Hudson2, Satoshi Hamaguchi1 (1.Osaka University, 2.Lam Research Corp.)
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10:15 AM - 10:30 AM
〇Tomohiro Kuyama1,2, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.JSPS Research Fellow)
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10:30 AM - 10:45 AM
〇Takahiro Goya1, Tomohiro Kuyama1,2, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.JSPS Research Fellow)
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10:45 AM - 11:00 AM
〇Akiko Hirata1,2, Masanaga Fukasawa1, J. U. Tercero2, Tomoko Ito2, Michiro Isobe2, Kazuhiro Karahashi2, Satoshi Hamaguchi2, Katsuhisa Kugimiya1, Yoshiya Hagimoto1, Hayato Iwamoto1 (1.Sony Semiconductor Solutions Corp., 2.Osaka Univ.)
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11:00 AM - 11:15 AM
〇Shota Nunomura1, Isao Sakata1, Takayoshi Tsutsumi2, Masaru Hori2 (1.AIST, 2.Nagoya Univ.)
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11:15 AM - 11:30 AM
〇Shota Nunomura1, Isao Sakata1, Aiko Sato1, Michael Lozac'h1, Tatsuya Misawa2, Naho Itagaki3, Masaharu Shiratani3 (1.AIST, 2.Saga Univ., 3.Kyushu Univ.)
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