[A-3-2] The Orientation Dependence of Impurity Sticking on Si Molecular Beam Epitaxy

Naoto Matsuo、Yuichi Hirofuji (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-3-3] Si/SrO/Si Heteroepitaxial Structure Formation by Molecular Beam Epitaxy

Yuichi Kado、Yoshinobu Arita (1.NTT Electrical Communications Laboratories)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-3-4] Low Pressure Silicon Epitaxy Using Si2H6

Fumitake MIENO、Yuji FURUMURA、Mamoru MAEDA (1.Process Engineering Dept. Semiconductors Group Fujitsu Ltd.)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-3-5] Low Temperature Low Pressure Silicon Epitaxial Growth and Its Application to Advanced Dielectric Isolation Technology

John O. Borland、Dennis N. Schmidt、Alan R. Stivers (1.Epi Applications Laboratory Applied Materials, Inc.、2.Silicon Device Development Westinghouse R&D Center、3.Technology Development Intel Corporation)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-1-1] P-well/N-well Compatible CMOS Processing for ASIC Applications

Tadahiro KURODA、Hiroyuki AKIBA、Hiroaki SUZUKI、Takao AOKI (1.Integrated Circuit Division, TOSHIBA Corporation)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-1-2] Advanced OSELO Isolation with Shallow Grooves for Three-quarter Micron ULSIs

Toru KAGA、Yoshifumi KAWAMOTO、Shin-pei IIJIMA、Yoshimi SUDOH、Yoshio SAKAI (1.CENTRAL RESEARCH LABORATORY, HITACHI Ltd.)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-1-3] An Analog BIMOS Technology

F. Rausch、H. Lindeman、W. Josquin、D. de Lang、P. J. W. Jochems (1.Philips Bipolar IC Development)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-2-1] Small Geometry Device Physics and Technology

Chihiro Hamaguchi、Arata Hasegawa、Masayoshi Shirahata (1.Department of Electronic Engineering, Faculty of Engineering Osaka University)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-2-2] Submicron MOSFETs with S/D Diffusions on a Field Insulator

Hiroshi Inokawa、Toshio Kobayashi、Kazuhide Kiuchi (1.NTT Electrical Communications Laboratories)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-2-3] Influence of Thermal Diffusion on Submicron MOST's

B. Meinerzhagen、W. L. Engl (1.Institut fur Theoretische Elektrotechnik, RWTH Aachen)

1986 International Conference on Solid State Devices and Materials |PDF ダウンロード