Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[10p-Z05-1~19] 6.4 Thin films and New materials

Thu. Sep 10, 2020 12:30 PM - 5:30 PM Z05

Katsuhisa Tanaka(Kyoto Univ.), Yoshinobu Nakamura(Univ. of Tokyo), Yuji Muraoka(Okayama Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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12:30 PM - 12:45 PM

▲ [10p-Z05-1] Identify the rippled structure of MoS₂ film from HRTEM image

〇(D)Lilin Xie¹, Yoshifumi Oshima¹ (1.JAIST)

12:45 PM - 1:00 PM

[10p-Z05-2] Surface Modification of Epitaxial Graphene for Thin-Film Si Growth

〇(M1)Tomohiro Katsuzaki¹, Riku Shamoto¹, Ryuichi Hirai¹, Akihiro Hashimoto¹ (1.Univ. of Fukui)

1:00 PM - 1:15 PM

[10p-Z05-3] Characterization of Surface diffusion in Na₂B₁₂H₁₁SH monolayer on Au(111)

〇(D)Takanori Harashima¹, Yoshihide Hattori², Hiroshi Shiigi³, Tomoaki Nishino¹ (1.Tokyo Institute of Technology, 2.Research Center of BNCT, Osaka Prefecture Univ., 3.Graduate School of Engineering, Osaka Prefecture Univ.)

1:15 PM - 1:30 PM

[10p-Z05-4] Fabrication and structural analysis of a-CNx:H thin films with high nitrogen content by microwave plasma CVD of the acetylene-nitrogen gas mixture

〇(M1)Yuga Sato¹, Haruhiko Ito¹ (1.Nagaoka Univ.)

1:30 PM - 1:45 PM

[10p-Z05-5] Synthesis and structural analysis of high nitrogen containing a-CNx:H thin films using radio frequency plasma CVD of the acetylene-N₂-Ar gas mixture

〇(M1)Ryota Watanuki¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech.)

1:45 PM - 2:00 PM

[10p-Z05-6] Attempt to Measure Thermal Diffusivity Using H₂-O₂ Flame of Ceramic Films Obtained by Atmospheric Chemical Vapor Deposition

〇Hidemichi Honda¹, Yanxin Dan¹, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech.)

2:00 PM - 2:15 PM

[10p-Z05-7] Synthesis of Nickel-related compounds Films via Metal-EDTA Complex Solution
with Strong Heat Process

Zhenyu Guo¹, Liang Shaoji¹, Atsushi Nakamura^2,1, 〇Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

2:15 PM - 2:30 PM

[10p-Z05-8] Attempt to Cu-Zn Alloy Coating from Metal-EDTA Complex Solutions
with Strong Heat Process

〇(M1)SHAOJI LIANG¹, Atsushi Nakamura^2,1, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

2:30 PM - 2:45 PM

[10p-Z05-9] Fabrication and Electrical/Optical Characterization of Metal Nanomesh Structures

〇Mai Ugajin¹, Takayuki Kiba¹, Midori Kawamura¹, Yoshio Abe¹, Kyung Ho Kim¹, Yafeng Chen², Junichi Takayama², Satoshi Hiura², Akihiro Murayama² (1.Kitami Inst. Tech., 2.IST, Hokkaido Univ.)

3:00 PM - 3:15 PM

△ [10p-Z05-10] Characterzation of Al/Ag film consists of layers sputtered in different gases

〇Yusaku Ohara¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Kyung Ho Kim¹ (1.Kitami Inst. Tech.)

3:15 PM - 3:30 PM

△ [10p-Z05-11] Analysis on Effects of Underlayer on Corrosion Resistance of Ag-based Transparent Conductive Film in Chloride Solution

〇Tomohiro Otani¹, Yuto Toshimori¹, Sohei Nonaka¹ (1.Mitsubishi Materials Corp.)

3:30 PM - 3:45 PM

△ [10p-Z05-12] Effect of 172 nm vacuum-ultraviolet light irradiation to the cyclic olefin polymer substrate surface on orientated growth of ZnO thin films

〇(D)Tomoaki Oga¹, Atsushi Oshima¹, Naho Kaneko¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

3:45 PM - 4:00 PM

△ [10p-Z05-13] Study on the growth condition of Zn_xMn_1-xS buffer layer for nonpolar AlN growth on Si

〇Masaya Morita^1,2, Keiji Ishibashi³, Kenichirou Takahashi³, Toyohiro Chikyow², Atsushi Ogura¹, Takahiro Nagata² (1.Meiji Univ., 2.NIMS, 3.COMET Inc.)

4:00 PM - 4:15 PM

△ [10p-Z05-14] Growth of high-quality CuI thin films by molecular beam epitaxy

〇(M2)Sotaro Inagaki¹, Masao Nakamura^2,3, Naoya Aizawa^2,3, Licong Peng², Xiuzhen Yu², Yoshinori Tokura^1,2,4, Masashi Kawasaki^1,2 (1.Univ. of Tokyo, 2.RIKEN-CEMS, 3.JST-PRESTO, 4.Tokyo College)

4:15 PM - 4:30 PM

▼ [10p-Z05-15] The thickness effect on the BiOI thin films prepared by SILAR

〇(M2)MATIUR MD RAHMAN¹, M.A. Al Noman¹, Shinya Kato¹, Naoki Kishi¹, Tetsuo Soga¹ (1.Nagoya Inst. of Tech)

4:30 PM - 4:45 PM

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO_2.5 Films

〇(DC)Qian Yang¹, Bin Feng², Yuichi Ikuhara², Hyoungjeen Jeen³, Hai Jun Cho^1,4, Hiromichi Ohta^1,4 (1.IST-Hokkaido U., 2.U. Tokyo, 3.Pusan Nat'l U., 4.RIES-Hokkaido U.)

4:45 PM - 5:00 PM

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni_1-xFe_xO(111) epitaxial thin films

〇(M2)Yoshiharu Shinozaki¹, Kenta Kaneko¹, Nobuo Tsuchimine², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.TOSHIMA Manu., 3.KISTEC)

5:00 PM - 5:15 PM

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2

〇(M1)Taisei Wakamiya¹, Shigeharu Matumoto², Hiroshi Murotani¹ (1.Graduate School of Eng. , Tokai Univ., 2.SHINCRON CO.LTD.)

5:15 PM - 5:30 PM

△ [10p-Z05-19] Solid state crystallization of titanium oxide thin films, and modification of their optical and electric properties by post-depositional uniaxial compressive annealing

〇(M2)Takahiro Ikuta¹, Shohei Hisatomi¹, Tomoaki Oga¹, Kaneko Satoru^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

Session information

[10p-Z05-1~19] 6.4 Thin films and New materials

▲ [10p-Z05-1] Identify the rippled structure of MoS₂ film from HRTEM image

[10p-Z05-2] Surface Modification of Epitaxial Graphene for Thin-Film Si Growth

[10p-Z05-3] Characterization of Surface diffusion in Na₂B₁₂H₁₁SH monolayer on Au(111)

[10p-Z05-4] Fabrication and structural analysis of a-CNx:H thin films with high nitrogen content by microwave plasma CVD of the acetylene-nitrogen gas mixture

[10p-Z05-5] Synthesis and structural analysis of high nitrogen containing a-CNx:H thin films using radio frequency plasma CVD of the acetylene-N₂-Ar gas mixture

[10p-Z05-6] Attempt to Measure Thermal Diffusivity Using H₂-O₂ Flame of Ceramic Films Obtained by Atmospheric Chemical Vapor Deposition

[10p-Z05-7] Synthesis of Nickel-related compounds Films via Metal-EDTA Complex Solution
with Strong Heat Process

[10p-Z05-8] Attempt to Cu-Zn Alloy Coating from Metal-EDTA Complex Solutions
with Strong Heat Process

[10p-Z05-9] Fabrication and Electrical/Optical Characterization of Metal Nanomesh Structures

△ [10p-Z05-10] Characterzation of Al/Ag film consists of layers sputtered in different gases

△ [10p-Z05-11] Analysis on Effects of Underlayer on Corrosion Resistance of Ag-based Transparent Conductive Film in Chloride Solution

△ [10p-Z05-12] Effect of 172 nm vacuum-ultraviolet light irradiation to the cyclic olefin polymer substrate surface on orientated growth of ZnO thin films

△ [10p-Z05-13] Study on the growth condition of Zn_xMn_1-xS buffer layer for nonpolar AlN growth on Si

△ [10p-Z05-14] Growth of high-quality CuI thin films by molecular beam epitaxy

▼ [10p-Z05-15] The thickness effect on the BiOI thin films prepared by SILAR

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO_2.5 Films

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni_1-xFe_xO(111) epitaxial thin films

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2

△ [10p-Z05-19] Solid state crystallization of titanium oxide thin films, and modification of their optical and electric properties by post-depositional uniaxial compressive annealing

Authenticate

Session information

[10p-Z05-1~19] 6.4 Thin films and New materials

▲ [10p-Z05-1] Identify the rippled structure of MoS2 film from HRTEM image

△ [10p-Z05-10] Characterzation of Al/Ag film consists of layers sputtered in different gases

△ [10p-Z05-11] Analysis on Effects of Underlayer on Corrosion Resistance of Ag-based Transparent Conductive Film in Chloride Solution

△ [10p-Z05-12] Effect of 172 nm vacuum-ultraviolet light irradiation to the cyclic olefin polymer substrate surface on orientated growth of ZnO thin films

△ [10p-Z05-13] Study on the growth condition of ZnxMn1-xS buffer layer for nonpolar AlN growth on Si

△ [10p-Z05-14] Growth of high-quality CuI thin films by molecular beam epitaxy

▼ [10p-Z05-15] The thickness effect on the BiOI thin films prepared by SILAR

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO2.5 Films

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni1-xFexO(111) epitaxial thin films

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2

△ [10p-Z05-19] Solid state crystallization of titanium oxide thin films, and modification of their optical and electric properties by post-depositional uniaxial compressive annealing

Authenticate

▲ [10p-Z05-1] Identify the rippled structure of MoS₂ film from HRTEM image

△ [10p-Z05-13] Study on the growth condition of Zn_xMn_1-xS buffer layer for nonpolar AlN growth on Si

▼ [10p-Z05-16] Solid-State Electrochemical Protonation/Oxidation of Oxygen Sponge SrCoO_2.5 Films

△ [10p-Z05-17] Magnetoresistance of low temperature PLD grown Ni_1-xFe_xO(111) epitaxial thin films

△ [10p-Z05-18] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 2