[B-2-6] Characterization of a New Gate Insulator BN on InP Grown by Low-Temperature CVD

Eiich Yamaguchi, Makoto Minakata (1.Musashino Electrical Comnunication Laboratory, NTT)

1983 Conference on Solid State Devices and Materials |PDF Download

[B-2-7] Some Aspects of Research and Development in III-V Semiconductors in British Industry and Universities

P. N. Robson (1.Department of Electronic and Electrical Engineering, The University of Sheffield)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-1] Recent Progress in SOI Technology

Hon Wai Lam (1.Texas Instruments Incorporated)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-2] Growth Conditions of Evaporated Amorphous Si Films onto SiO2, Patterns by Lateral Solid Phase Epitaxy

Hiroshi Yamamoto, Hiroshi Ishiwara, Seijiro Furukawa, Masao Tamura, Takashi Tokuyama (1.Department of Applied Electronics, Tokyo Institute of Technology, 2.Central Research Laboratroy, Hitachi Ltd.)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-3] Lateral Epitaxy of Si Films Deposited in a UHV Ambient by Electron Beam Annealing

Tomoyasu Inoue, Kenji Shibata, Koichi Kato, Yuichi Mikata, Masahiro Kashiwagi (1.Toshiba Research and Development Center, 2.Toshiba Semiconductor Device Engineering Laboratory, 3.Toshiba Corporation)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-4] E-Beam Recrystallized SOI

Hiroshi Ishiwara (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-5] Silicon Film Recrystallization by Line Electron Beam

S. Saitoh, H. Okabayashi, K. Higuchi (1.Microelectronics Research Labs., NEC Corporation)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-3-6] Characterization of 0.1 μm Thick Isolated Silicon Layers on Porous Oxidized Silicon

Kazuo Imai, Hideyuki Unno (1.Atsugi Electrical Communication Laboratory, NTT)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-4-1] Microelectronic Thin Film Deposition by UV Laser Photolysis

P. K. Boyer, C. A. Moore, R. Solanki, W. K. Ritchie, G. J. Collins (1.Department of Electrical Engineering Colorado State University)

1983 Conference on Solid State Devices and Materials |PDF Download

[A-4-2] Photo-CVD Silicon Nitride and Silicon Oxide Films for VLSI Application

M. Hatanaka, H. Ito, H. Abe, H. Nakata (1.LSI R&D Laboratory, Mitsubishi Electric Corporation)

1983 Conference on Solid State Devices and Materials |PDF Download