[A-0-1] Recent Progress in Low Temperature Photochemical Processes

Jun-ichi Nishizawa、Yoshihiro Kokubun (1.Research Institute of Electrical Communication, Tohoku University、2.Research Development Corporation of Japan c/o Semiconductor Research Institute)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-0-2] Submicron Si Technology: Present, Future and Impacts on Electronic Age

M. P. Lepselter (1.AT & Bell Laboratories)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-1-1] Submicron Lithography Using Contrast Enhancement

B. F. Griffing、P. R. West (1.General Electric Company Corporate Research and Development)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-1-2] X-Ray Lithography Using Synchrotron Radiation

Koichiro Hoh (1.Electrotechnical Laboratory)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-1] Refractory Metals and Silicides for Si MOS VLSI's

S. Iwata (1.Central Research Lab., Hitachi, Ltd.)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-2] Nanometer E-Beam Lithography Using 2-Layer Resist System Composed of Silicone-Based Negative Resist (SNR)

Akio Sugita、Masao Morita、Toshiaki Tamamura (1.Ibaraki Electrical Communication Laboratory, NTT)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-3] A High Contrast Submicron X-Ray Mask with Ta Absorber Patterns

M. Sekimoto、A. Ozawa、T. Ohkubo、H. Yoshihara (1.Atsugi Electrical Communication Laboratory, N.T.T.)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-4] Fine Pattern Difinition with Focused Ion Beams and Its Application to X-Ray Mask Fabrication

Toshihiko KANAYAMA、Masanori KOMURO、Hiroshi HIROSHIMA、Tsunehiro OHIRA、Nobufumi ATODA、Hisao TANOUE、Toshio TSURUSHIMA (1.Electrotechnical Laboratory)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-5] Characteristics of Selective Deposition of Metal Organic Films Using Focused Ion Beams

Kenji Gamo、Nobuyuki Takakura、Daisuke Takehara、Susumu Namba (1.Department of Electrical Engineering Faculty of Engineering Science, Osaka University)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-2-6] Formation of SPE-CoSi2 Submicron Line by Lift Off Using Selective Reaction

Kouichirou Ishibashi、Seijiro Furukawa (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

1984 International Conference on Solid State Devices and Materials |PDF ダウンロード