The Japan Society of Applied Physics

262 results (71 - 80)

[PB2-4] Low Damage Magnetron Enhanced Reactive Ion Etching

Masayuki SATO, Daisuke KIMURA, Nobuyuki TAKENAKA, Shigeo ONISHI, Keizo SAKIYAMA, Tohru HARA (1.VLSI Development Laboratories, IC-Group, SHARP Corporation, 2.Department of Electrical Engineering, Hosei University)

1991 International Conference on Solid State Devices and Materials |PDF Download

262 results (71 - 80)