[PD-3-2] Mo Contamination in p/p+ Epitaxial Silicon Wafers

Masaki Aoki、Toru Itakura、Nobuo Sasaki (1.Fujitsu Laboratories Ltd.)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-3-3] Oxygen and Fluorine Treatment Effect on Silicon Surface Characterized by High-Sensitivity Infrared Reflection Spectroscopy

Masanori OKUYAMA、Masahiro NISHIDA、Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-3-4] Native Oxide Growth Rate of Si Surface with Various Flatness

T. Itoga、A. Hiraoka、F. Yano、J. Yugami、M. Ohkura (1.Central Research Laboratory, Hitachi Ltd.)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-3-5] Novel Dry Cleaning Using AHF-Alcohol with the New "Hot"Cluster Tool

F. Mieno、K. Suzuki、A. Shimizu、A. Tsukune、S. Sugawa、S. Kudoh、M. Nagase、M. Kawano (1.Mass Production Div., Iwate Plant, FUJITSU limited、2.Process Development Div., Mie Plant, FUJITSU limited)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-3-6] Different Hydrogen Passivation Effects on Low-Temperature and High-Temperature Processed Poly-Si TFT's

Y. S. Kim、K. Y. Choi、S. K. Lee、Y. H. Kim、M. K. Han (1.Dep't. of Electrical Eng., Seoul Nat'l Univ.、2.Dep't of Electronic Materials Eng., The Univ. of Suwon)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-4-1] High Rate Selective Etching of a-Si:H and Modification Effect of a-SiNx:H Surface by Hydrogen Radical

Hiroshi NAGAYOSHI、Misako YAMAGUCHI、Makoto IKEDA、Yuichi YAMAMOTO、Koichi KAMISAKO、Yasuo TARUI (1.Division of Electronic and Information Engineering, Faculty of Technology Tokyo University of Agriculture and Technology、2.School of Science and Engineering, Waseda University)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-4-2] Self-Align-Contact Etching with Inductive Coupled Plasma

Masayuki SATO、Takayuki TOHDA、Hiroyuki KAWANO、Daisuke TAKEHARA Nobuyuki TAKENAKA、Akira ISHIHAMA、Keizo SAKIYAMA (1.VLSI Development Laboratories, IC-Group, SHARP Corporation)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-4-3] Controlling Crystalline Orientations of Sol-Gel PZTs for FRAM and DRAM Applications

Katsuhiro Aoki、Yukio Fukuda、Ken Numata、Akitoshi Nishimura (1.ULSI Development & Productization, Texas Instruments Japan Limited)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-4-4] Suppression of Boron Penetration in pMOS by Using Oxide Gettering Effect in Poly-Si Gate

Yung Hao Lin、Tien Sheng Chao、Chung Len Lee、Tan Fu Lei (1.Department of Electronics Engineering and Institute of Electronics National Chiao Tung University、2.National Nano Device Laboratory)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PD-4-5] A Novel LOCOS SPI (Self-Aligned-Pocket-Implantation) Technology for a Half Micron NMOSFET

C. J. KIM、H. W. JANG、Y. S. JANG、J. H. JIN、S. K. LIM、K. H CHOI (1.SAMSUNG Electronics, Semiconductor R&D Center, Micro Process Development Buchun)

1994 International Conference on Solid State Devices and Materials |PDF ダウンロード

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