Oral presentation

[20a-C101-1~13] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 20, 2022 9:00 AM - 12:30 PM C101 (C101)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

[20a-C101-1] Selected Area Crystallization in Amorphous Film by Electron Beam Irradiation

〇(M2)Shunsuke Tanahashi¹, Tomoharu Tokunaga¹, Takahisa Yamamoto¹ (1.Nagoya Univ.)

9:15 AM - 9:30 AM

[20a-C101-2] Mask production for Extreme Ultraviolet (EUV) Lithography

〇Hiroki Yamamoto¹, Takahiro Kozawa² (1.QST, 2.ISIR,Osaka Univ.)

9:30 AM - 9:45 AM

△ [20a-C101-3] Development of flexible transparent electrode by silver line laser patterning

〇Mai Hayase¹, Masato Sumiyoshi¹, Makoto Takishita¹, Vygantas Mizeikis¹, Atsushi Ono¹ (1.Shizuoka Univ.)

9:45 AM - 10:00 AM

[20a-C101-4] Verification of Resist Patterning by Stereophonic Projection Lithography Using a Pair of Parabolic Mirrors Illuminated by Collimated Light from a Blue Light-Emitting-Diode

〇Toshiyuki Horiuchi¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

10:00 AM - 10:15 AM

[20a-C101-5] Pattern prediction in EB lithography using molecular simulation and deep learning

〇Bunta Inoue¹, Yoshihiko Hirai², Masaaki Yasuda² (1.Osaka Pref. Univ., 2.Osaka Met. Univ.)

10:15 AM - 10:30 AM

[20a-C101-6] Analysis of resist charging in electron beam lithography

〇(M2)Yoshinobu Kono¹, Nishiguchi Akio¹, Kotera Masatoshi¹ (1.Osaka Inst.)

10:30 AM - 10:45 AM

[20a-C101-7] Molecular dynamics study of electron beam lithography for negative type resists

〇Kaito Yamada¹, Hirai Yoshihiko², Yasuda Masaaki² (1.Osaka Pref. Univ., 2.Osaka Met. Univ.)

11:00 AM - 11:15 AM

[20a-C101-8] Verification of Thermal Properties of Thermal Nanoimprint Resin for Deep Learning

〇Kai Kameyama², Yuusei Kunitou¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Metropolitan Univ., 2.Osaka Prefecture Univ.)

11:15 AM - 11:30 AM

[20a-C101-9] Study on smart process design for thermal nanoimprint lithography based on deep learning systems

〇(M1C)Yuusei Kunitou¹, Ryuhei Yamamura², Kai Kameyama², Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Metropolitan Univ, 2.Osaka Pref Univ)

11:30 AM - 11:45 AM

[20a-C101-10] Fabrication of self-stamding resin thin film with through holes by combined use of thermal imprint and photolithography

〇Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Metro. Univ.)

11:45 AM - 12:00 PM

[20a-C101-11] Fabrication of polymeric nanopillars and their application to antibacterial materials

〇(M1C)Ikki Shingeya¹, Natsuki Ogawa¹, Takeshi Ito¹, Tomohiro Shimizu¹, Shousou Shingubara¹ (1.Kansai Univ.)

12:00 PM - 12:15 PM

[20a-C101-12] Fabrication of adhesive water-repellent film using moth-eye structure mold and micro patterning

〇(M1)Kazuki Arai¹, Jun Taniguchi¹, Hiroyuki Sugawara² (1.TUS, 2.GEOMATEC)

12:15 PM - 12:30 PM

[20a-C101-13] Two-tone pattern transfer using nanoimprint and silver ink

〇(M1)Keisuke Enomoto¹, Jun Taniguchi¹ (1.TUS)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication