The Japan Society of Applied Physics

463 results (171 - 180)

[D-10-2] Theoretical Analysis of Oxygen Diffusion in monoclinic HfO2

Minoru Ikeda, Georg Kresse, Toshihide Nabatame, Akira Toriumi (1.MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 2.Institut fur Materialphysik, Univeisitat Wien, 3.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technologies (AIST), 4.Department of Materials Science School of Engineering, University of Tokyo)

2003 International Conference on Solid State Devices and Materials |PDF Download

[D-10-3] Etching yields of HfO2 under Ar+ and CFX+ (X = 1, 2, 3) ion beam irradiation

Kazuhiro Karahashi, Nobuhisa Yamagishi, Tsuyoshi Horikawa, Akira Toriumi (1.MIRAI Project Association of Super -Advanced Electronics Technologies (ASET), 2.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 3.Deparatment of Materials Science School of Engineering, University of Tokyo)

2003 International Conference on Solid State Devices and Materials |PDF Download

463 results (171 - 180)