[F-7-3] P-SONOS and N-SONOS Transient Current and Field Modeling for Program and Erase

Pei-Ying Du、Jyh-Chyurn Guo (1.Institute of Electronics, National Chiao-Tung University)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-7-4] Lateral Redistribution and Interactive Impacts of Localized Trapped Charges during Retention Baking in SONOS Memory

Huiqing Pang、Liyang Pan、Lei Sun、Dong Wu、Jun Zhu (1.Institute of Microelectronics, Tsinghua University)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-7-5L] Tunnel Oxide Optimization to Improve Post-Cycling Retention of Flash Memories

Wook-Hyun Kwon、Jung Guen Jee、Jee Hoon Han、Jung In Han、Heon Kyu Lee、Bong Yong Lee、Sang-Pil Sim、Chan- Kwang Park、Kinam Kim (1.Advanced Technology Development Team2, Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., LTD.)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-8-1] Process Integration of Low-Power and High-Speed 16Mb MRAM using Multi-Layer Wiring Technology

T. Kajiyama、S. Miura、Y. Asao、T. Ueda、H. Aikawa、M. Iwayama、K. Hosotani、M. Amano、M. Yoshikawa、K. Tsuchida、S. Ikegawa、T. Kishi、N. Shimomura、N. Ohshima、H. Hada、A. Nitayama、S. Tahara、H. Yoda (1.Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation、2.Corporate Research & Development Center, Toshiba Corporation、3.System Devices Research Laboratories, NEC Corporation)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-8-2] New Magnetic Nano-Dot Memory with FePt Nano-Dots

Cheng-Kuan Yin、Ji-Chel Bea、Mariappan Murugesan、Mikihiko Oogane、Takafumi Fukushima、Tetsu Tanaka、Kenji Natori、Masanobu Miyao、Mitsumasa Koyanagi (1.Dept. Bioengineering and Robotics, Tohoku University、2.Japan Science and Technology Agency (JST)、3.Department of Applied Physics, Graduate School of engineering, Tohoku University、4.Dept. Institute of Applied Physics, Tsukuba University、5.Dept. Electronics, Kyushu University)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-8-3] Optimization of Ring Type Electrode Process for High Density PRAM

K. C. Ryoo、Y. J. Song、D. H. Kang、C. W. Jeong、J. H. Kong、J. H. Oh、D. W. Lim、S. S. Park、J. I .Kim、J. H. Kim、J. H. Park、Y. T .Oh、J. S. Kim、J. M. Shin、J. H. Park、K. W. Lee、Y. Fai、G. H. Koh、G. T. Jeong、H. S. Jeong、Kinam Kim (1.Advanced Technology Development, Semiconductor R&D Div., Samsung Electronics Co., Ltd)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-8-4] Characteristics Improvement of Phase Change Memory with Programming Pulse Width

Der-Sheng Chao、Chain-Ming Lee、Yi-Chan Chen、Philip H. Yen、Ding-Yeong Wang、Ming-Jung Chen、Shen-Chuan Lo、Hong-Hui Hsu、Wen-Han Wang、Fred Chen、Yen Chuo、Chenhsin Lien、Ming-Jer Kao、Ming-Jinn Tsai (1.Electronics and Optoelectronics Research Laboratories (EOL), ITRI、2.Material and Chemical Research Laboratories (MCL), ITRI、3.Institute of Electronics Engineering, National Tsing Hua University)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-8-5] Thickness Dependent Nano-Crystallization in Ge2Sb2Te5 films and Its Effect on Devices

Wei Xiaoqian、Shi Luping、Chong Tow Chong (1.Data Storage Institute、2.Elec. &Comp. Eng. department, National University of Singapore)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-9-1] Dopant Segregated Pt-Germanide Schottky S/D p-MOSFET with HfO2/TaN gate on Strained Si-SiGe channel

Wei-Yip Loh、YiXuan Chen、S. J. Lee、L. K. Bera、Rong Yang、Guo-Qiang Lo、Dim-Lee Kwong (1.Institute of Microelectronics、2.Silicon Nano Device Lab., National University of Singapore)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード

[F-9-2] Improved Performance of Schottky Barrier Source/Drain Transistors with High-K Gate Dielectrics by Adopting Recessed Channel and/or Buried Source/Drain Structures

Mizuki Ono、Masato Koyama、Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation)

2006 International Conference on Solid State Devices and Materials |PDF ダウンロード