Symposium

[17p-A14-1~12] Interfacial nano electrochemistry: Research frontiers of semiconductor wetprocesses

Wed. Sep 17, 2014 1:30 PM - 5:30 PM A14 (E305)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:30 PM - 1:45 PM

[17p-A14-1] Opening talk: The aim of this symposium

^○Daisaku Yano¹ (Organo¹)

1:45 PM - 2:15 PM

[17p-A14-2] Electrochemical etching of III-V compound semiconductors for micro- and nanofabrications

^○Taketomo Sato¹, Yusuke Kumazaki¹, Akio Watanabe¹, Zenji Yatabe¹ (RCIQE, Hokkaido Univ.¹)

2:15 PM - 2:45 PM

[17p-A14-3] A new approach to establish a novel standard of required qualities for cleaning processes-A necessity of collaboration with STRJ, SEMI, and INE-

^○Hiroshi Tomita¹ (CSRD¹)

2:45 PM - 3:00 PM

[17p-A14-4] Effect of viscoelasiticity of PVA brush on the friction

^○Toshiyuki Sanada¹, Yoshitaka Hara¹, Akira Fukunaga², Hirokuni Hiyama² (Shizuoka Univ.¹, Ebara Coap.²)

3:00 PM - 3:15 PM

[17p-A14-5] Challenge of wafer charge removal for Single wet clean system

^○Takayuki Toshima¹ (TOKYO ELECTRON KYUSHU LIMITED¹)

3:15 PM - 3:30 PM

[17p-A14-6] Particle removal efficiency evaluation of filters in 150 ℃ sulfuric acid

^○Tomoyuki Takakura¹, Shuichi Tsuzuki¹ (Nihon Pall Ltd.¹)

Break 15:30～15:45 （3:30 PM - 3:45 PM）

3:45 PM - 4:15 PM

[17p-A14-7] Atomic-scale Control of Semiconductor Surfaces by Wet-chemical Preparations for Future Electronics

^○Kenta Arima¹ (Osaka Univ.¹)

4:15 PM - 4:30 PM

△ [17p-A14-8] Fabrication of Nanogap Electrodes Using Semiconductor Process

^○Yasuhito Yoshimizu¹, Yusuke Tanaka¹, Hiroshi Tomita¹ (TOSHIBA Corp.¹)

4:30 PM - 4:45 PM

[17p-A14-9] Research for Mechanism of Abnormal Oxidation on Copper Surface

^○Kohei Hayashi¹, Takayuki Kajikawa¹, Tsutomu Watahiki¹ (Wako pure chemical industries, Ltd¹)

4:45 PM - 5:00 PM

[17p-A14-10] Low concentration dissolved oxygen monitoring for wet chemical solution

^○Kentaro Inoue¹, Kazunori Habu¹, Hisanori Kuramoto¹ (Horiba Advanced Techno¹)

5:00 PM - 5:15 PM

[17p-A14-11] Molecular Dynamics Analysis on the Microscopic Behavior of Water and Alcohol near SiO₂ Surface

^○Satoshi Nakaoka¹, Yasutaka Yamaguchi¹, Masayuki Kawakami², Daisaku Yano², Koji Yamanaka² (Osaka Univ.¹, Organo Corp.²)

5:15 PM - 5:30 PM

[17p-A14-12] Closing remarks: Wet process for the next generation

^○Toshiyuki Sanada¹ (Shizuoka Univ.¹)

Sessions

Symposium » Interfacial nano electrochemistry: Research frontiers of semiconductor wetprocesses