[S-F-7] Discovery of Activation Energy Enhancement during Initial Silicon-Oxide Growth and Its Physical Modeling for Accurate Process Simulation

Shiroo Kamohara, Yoshiaki Kamigaki (1.Central Research Laboratory, Hitachi, Ltd.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-8] The Dry Etching of Oxides Using Anhydrous HF

Richard E. Novak, Daniel J. Syverson (1.FSI International, Inc.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-9] Progressive Technology of Fluoride Chemicals for ULSI Manufacturing

Nobuhiro MIKI, Ichiroh KAWANABE, Tadahiro OHMI (1.The Department of Electronics, Faculty of Engineering, Tohoku University, 2.Hashimoto Chemical Co., LTD.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-10] HF Surface Passivation Failure in Integrated Thermal Oxidation Processing

M. Liehr, M. Offenberg, S. R. Kasi, G. W. Rubloff, K. Holloway (1.IBM Research Division, T. J. Watson Research Center)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-11] Reliability-Improvement of the MOS Structures Using Photo-Excited Dry Cleaning before Oxidation

Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Takashi Ito (1.Fujitsu Laboratories Ltd.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-12] Initial Oxidation of Clean and Metal-Deposited Si(100) Surfaces by Super-Pure Oxygen Gas

M. OSHIMA, H. SUGAHARA, N. KAWAMURA, N. YABUMOTO, K. MINEGISHI (1.NTT Applied Electronics Laboratories, 2.NTT LSI Laboratories)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-13] Initial Oxidation Reaction on Cl-Adsorbed Si Surfaces

Nahomi Aoto, Hirohito Watanabe, Eiji Ikawa, Takamaro Kikkawa (1.Microelectronics Research Laboratories, NEC Corporation)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-14] Thermal Desorption Mechanism of Native Oxides on Si Substrates: TDS and STM Observation

Y. Kobayashi, K. Sugii (1.NTT Basic Research Laboratories)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-15] Tunneling Spectroscopy of Ultra-Thin Oxide on Si(111)

Michiharu Tabe, Masafumi Tanimoto (1.NTT LSI Laboratories)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-16] Optical Absorption in Silicon Oxide Film Near the SiO2/Si Interface

Takashl HAGA, Noriyuki MIYATA, Kazunori MORIKI, Masami FUJISAWA, Tatsunori KANEOKA, Makoto HIRAYAMA, Takayuki MATSUKAWA, Takeo HATTORI (1.Musashi- Institute of Technology, 2.The Institute for Solid State Physics, The University of Tokyo, 3.LSI Research and Development Laboratory, Mitsubishi Electric Corporation)

1990 International Conference on Solid State Devices and Materials |PDF Download

310 results (271 - 280)

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