[S-F-17] A Mechanism of Particle Generation and a Method to Suppress Particles in Vapor HF/H2O System

Shigeo Onishi, Kenzou Matsuda, Keizou Sakiyama (1.VLSI development laboratory, IC-group, Sharp corp.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-18] Nondestructive Evaluation of Trace Metals and Application to Defect Generation

N. TSUCHIYA, M. TANAKA, M. KAGEYAMA, A. KUBOTA, Y. MATSUSHITA (1.Semiconductor Group, TOSHIBA Corp.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-19] Step Structure of the Vicinal Si(111) Surface

H. Hibino, Y. Shinoda, Y. Kobayashi, K. Sugii (1.NTT Basic Research Laboratories)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-20] Low Dissolved Oxygen Ultrapure Water Systems for Native Oxide Free Wafer Processing

Yasuhiko. Kasama, Yasuyuki. Yagi, Takashi. Imaoka, Tadahiro. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-21] Particle Counting in Semiconductor Processing Gas and Apparatus with a New Flow-Cell Type Laser Particle Counter

Kazuo ICHIJO, Kaoru KONDO, Tamio HOSHINA, Kazuo TSUBOUCHI, Kazuya MASU (1.RION CO., Ltd., 2.Research Institute of Electrical Communication, Tohoku University)

1990 International Conference on Solid State Devices and Materials |PDF Download

[S-F-22] Advanced Plasma Processing Equipment without Wafer Surface Damage and Chamber Material Contamination

Haruhiro Goto, Makoto Sasaki, Tadahiro Ohmi, Tadashi Shibata, Atsushi Yamagami, Nobuyuki Okamura, Osamu Kamiya (1.Department of Electronics, Faculty of Engineering, Tohoku University, 2.Thin Film Technology Div., Canon Inc.)

1990 International Conference on Solid State Devices and Materials |PDF Download

[LN-D-1] Suppression of Interfacial Mixing in Si/Ge Superlattices by Sb Deposition

K. FUJITA, S. FUKATSU, H. YAGUCHI, T. IGARASHI, Y. SHIRAKI, R. ITO (1.Research Center for Advanced Science and Technology, The University of Tokyo)

1990 International Conference on Solid State Devices and Materials |PDF Download

[LN-D-2] The Effects of Nitridation and Re-Oxidation on Drain Leakage Current in n-Channel MOSFETs

S. Fleischer, Z. H. Liu, P. T. Lai, Z. J. Ma, Y. C. Cheng (1.Dept. of Electrical & Electronic Engineering, University of Hong Kong)

1990 International Conference on Solid State Devices and Materials |PDF Download

[LN-D-3] High Quality Ultrathin Oxynitride Gate Dielectric Prepared by Rapid Thermal Processing in N2O

Hyunsang Hwang, Wenchi Ting, Dim-Lee Kwong, Jack Lee (1.Microelectonics Research Center, The University of Texas at Austin)

1990 International Conference on Solid State Devices and Materials |PDF Download

[LN-D-4] Improvement of the Laser-Recrystallized SOI Structure by a New Crystal Growth Mode

D. J. Wouters, T. Ipposhi, K. Sugahara, Y. Inoue, T. Nishimura, Y. Akasaka, H. E. Maes (1.LSI R&D Lab., Mitsubishi Electric Corp., 2.Interuniversity Micro-Electronics Center (IMEC))

1990 International Conference on Solid State Devices and Materials |PDF Download

310 results (281 - 290)

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