The Japan Society of Applied Physics

[A-2-01(Invited)] Experimental Demonstration of Negative Capacitance epi-Ge/Si FETs with Ferroelectric Hf-based Oxide Gate Stack for Swing Sub-60mV/dec and Hysteresis-Free

M. H. Lee1, P. G. Chen1,2, C. Liu3, K. T. Chen4, M. J. Xie1, S. N. Liu1, H. H. Chen1, C. H. Tang1, J. W. Lee1, W. H. Tu2, K. S. Li5, M. C. Chen5, M. H. Liao2, C. Y. Chang3,6, C. H. Cheng1, S. T. Chang4, C. W. Liu2 (1.National Taiwan Normal Univ.(Taiwan), 2.National Taiwan Univ.(Taiwan), 3.NCTU(Taiwan), 4.National Chung Hsing Univ.(Taiwan), 5.National Nano Device Lab.(Taiwan), 6.Academia Sinica(Taiwan))

2016 International Conference on Solid State Devices and Materials |2016年9月27日(火) 15:40 〜 16:10 |PDF ダウンロード