Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-Z24-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Thu. Mar 18, 2021 1:30 PM - 5:15 PM Z24 (Z24)

Seiichiro Higashi(Hiroshima Univ.), Tatsuya Okada(Univ. of the Ryukyus)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

△ [18p-Z24-1] Evaluation of crystal defects by Si trench processing using Raman and photoluminescence spectroscopy

〇Masato Koharada¹, Yuta Satake¹, Jun Yoshigiwa², Koichiro Saga², Hayato Iwamoto², Longxiang Men¹, Naomi Sawamoto^1,3, Ryo Yokogawa^1,3, Atsushi Ogura^1,3 (1.Meiji Univ., 2.Sony Semiconductor Solutions Corp., 3.Meiji Renewable Energy Lab.)

1:45 PM - 2:00 PM

[18p-Z24-2] Strain evaluation of As ion implanted Si using Raman spectroscopy

〇Masato Koharada¹, Yuta Satake¹, Ryo Yokogawa^1,2, Atsushi Ogura^1,2 (1.Meiji Univ., 2.Meiji Renewable Energy Lab.)

2:00 PM - 2:15 PM

[18p-Z24-3] Effects of sputter gas pressure on the formation of compressively strained SiGe thin film using sputter epitaxy method

〇Kento Ikeno¹, Yosuke Aoyagi², Nobumitsu Hirose³, Akifumi Kasamatsu³, Toshiaki Matsui³, Yoshiyuki Suda², Takahiro Tsukamoto¹ (1.Univ. Electro-Comm, 2.Tokyo Univ. of Agric. & Technol, 3.National Inst. of Information and Communications Technol)

2:15 PM - 2:30 PM

[18p-Z24-4] Study of wet etching for Ge-on-Insulator fabrication by etchback method

〇Noboru Shimizu¹, Keisuke Yamamoto¹, Dong Wang¹, Hiroshi Nakashima² (1.Kyushu Univ., 2.GIC, Kyushu Univ.)

2:30 PM - 2:45 PM

[18p-Z24-5] Study on instantaneous heating during deposition of amorphous silicon by plasma CVD

〇(M1)Taishi Nojima¹, Takuma Sato¹, Hiroaki Hanafusa¹, Seiitirou Higashi¹ (1.Hiroshima Univ.)

2:45 PM - 3:00 PM

[18p-Z24-6] Electrical Characteristics of Atmospheric Pressure Micro-Thermal-Plasma-Jet Crystallized P-type Germanium Film

〇Yusuke Akatsuka¹, Takuma Sato¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

3:00 PM - 3:15 PM

▲ [18p-Z24-7] Characteristics of Millisecond Solid Phase Crystallization of Phosphorus Doped Silicon Film Annealed by Thermal-Plasma-Jet Irradiation

〇(D)Nguyen ThiKhanh Hoa¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

3:30 PM - 3:45 PM

[18p-Z24-8] Crystallization of SiN Capped InSb Films on Glass by RTA

〇Genta Sakamoto¹, Asuka Shimabukuro¹, Takashi Noguichi¹, Tatsuya Okada¹ (1.Univ. Ryukyus)

3:45 PM - 4:00 PM

△ [18p-Z24-9] MEMS vapor cells with monolithically integrated alkali metal dispensing component

〇(M2)Shun Kiyose¹, Yoshikazu Hirai¹, Osamu Tabata², Toshiyuki Tsuchiya¹ (1.Kyoto Univ., 2.Kyoto Univ. of Adv. Sci.)

4:00 PM - 4:15 PM

△ [18p-Z24-10] A study on a single-axis Au proof-mass MEMS accelerometer with a wide detection range of acceleration

〇(M1)Akihiro Uchiyama¹, Takashi Ichikawa¹, Kohei Shibata¹, Shin-ichi Iida², Lee Sangyeop¹, Noboru Ishihara¹, Katsuyuki Machida¹, Kazuya Masu¹, Hiroyuki Ito¹ (1.Tokyo Tech, 2.NTT-AT)

4:15 PM - 4:30 PM

[18p-Z24-11] Measurement system by photogate type fluorescent sensor for identification of Legionella

〇Yuto Honda¹, Yong-Joon Choi¹, Kensuke Murakami¹, Hiromu Ishii¹, Toshihiko Noda¹, Kazuhiro Takahashi¹, Kazuaki Sawada¹, Katsuyuki Machida², Hiroyuki Ito², Mitsumasa Saito³, Yasuhiko Nikaido³ (1.Toyohashi Univ. of Technology, 2.Tokyo Inst of .Technology, 3.Univ. of Occupational and Environmental Health)

4:30 PM - 4:45 PM

[18p-Z24-12] Effect of Solution of Containing Glycerol for 2D Ferritin Arrangemen

〇Daisuke Ohori¹, Sou Takeuchi¹, Asahi Sato¹, Teruhisa Ishida², Masahiro Sota², Mami Tanaka², Kazuhiko Endo^1,3, Seiji Samukawa^1,3,4 (1.IFS, Tohoku Univ., 2.NAGASE & Co., LTD., 3.AIST, 4.AIMR, Tohoku Univ.)

4:45 PM - 5:00 PM

[18p-Z24-13] Study on the effects of surface treatment on wafer direct bonding by utilizing chemical derivatization XPS

〇Jian Cao¹, Yukako Ikegami¹, Takashi Ito¹, Takashi Togasaki¹, Hidehiko Yabuhara¹ (1.Toshiba Corp.)

5:00 PM - 5:15 PM

▲ [18p-Z24-14] Effect of surface step structures on the thermal responsivity of MEMS bolometers

〇(D)Boqi Qiu¹, Ya Zhang², Naomi Nagai¹, Kazuhiko Hirakawa¹ (1.IIS/INQIE, Univ. of Tokyo, 2.TUAT)

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