[P-0-1] Prospect of Quantum Heterostructure Materials and Devices

H. Sakaki (1.Institute of Industrial Science, University of Tokyo)

1986 International Conference on Solid State Devices and Materials |PDF Download

[P-0-2] SOR X-Ray Lithography

H. Betz (1.Fraunhofer-Institut fur Mikrostrukturtechnik (IMT))

1986 International Conference on Solid State Devices and Materials |PDF Download

[P-0-3] Nanometer-Scale Silicon MOSFETs

R. E. Howard, L. D. Jackel, P. M. Mankiewich, W. J. Skocpol (1.AT&T Bell Laboratories)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-1-1] A Statistical Analysis of Microlithography

Henry I. Smith (1.Massachusetts Institute of Technology)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-1-2] Theoretical Consideration on New Reflection Type X-Ray Lithography

Hideki Matsumura (1.Department of Physical Electronics, Hiroshima University)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-2-1] A New Mask-To-Wafer Alignment Technique for A-Quarter-Micron SR Lithography

Junji ITOH, Toshihiko KANAYAMA, Nobufumi ATODA (1.Electrotechnical Laboratory)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-2-2] Holographic Nanometer Alignment for a Wafer Stepper

Kazuhiro Yamashita, Noboru Nomura, Toyoki Takemoto (1.Basic Research Laboratory, Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-2-3] Sub-0.1-μm Ion Projection Lithography

Gerhard Stengl, Hans Loschner, Julius J. Muray (1.IMS - Ion Microfabrication Systems GmbH, 2.SRI International)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-2-4] Plasmask: A Novel Plasma Developed Resist Based on Selective Silylation

B. ROLAND, F. COOPMANS (1.UCB N.V., 2.IMEC vzw.)

1986 International Conference on Solid State Devices and Materials |PDF Download

[A-3-1] Oxygen-Doped Si Epitaxial Films for Si Hetero- Bipolar Transistors

M. Tabe, M. Takahashi, Y. Sakakibara (1.NTT Electrical Communications Laboratories)

1986 International Conference on Solid State Devices and Materials |PDF Download