The Japan Society of Applied Physics

428件中(231 - 240)

[P4-2] Investigation of (HfO2)x(Al2O3)1-x on (100) Si by XPS--energy gap and band alignment

H. Y. Yu、M. F. Li、D. L. Kwong、B. J. Cho、J. S. Pan、C. H. Ang、J. Z. Zheng (1.Silicon Nano Device Lab, ECE Department, National University of Singapore、2.Dept. Electrical and Computer Engineering, University of Texas at Austin、3.Institute of Materials Research & Engineering、4.Chartered Semiconductor Manufacturing Ltd.)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P4-5] Thermal Stability of HfO2/Ultrathin-SiO2/Si Structures

Noriyuki Miyata、Masakazu Ichikawa、Toshihide Nabatame、Akira Toriumi (1.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)、2.The University of Tokyo、3.MIRAI Project, Association of Super-Advanced Electronics Technology (ASET))

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

428件中(231 - 240)