[P14-5] Micro Chemical Analysis System Constructed with Stacked Modules for Multi-Analyte Detection

Hiroaki Suzuki、Takumi Taura、Shimpei Kojima (1.University of Tsukuba, Institute of Materials Science)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P14-6] Rapid applicable separation of DNA polymorphism on the human Y-chromosome by micro fabricated electrophoresis chip

Mohammad Jabasini、Lihua Zhang、Feng Xu、Fuquan Dang、Yoshinobu Baba (1.Department of Medicinal Chemistry, The university of Tokushim、2.CREST, JST、3.Furono electric Co., Ltd.、4.Shimadzu Corp.)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[LP14-1] A behavior of Xenon difluoride etching on poly-Silicon sacrificial layer for fabrication of MEMS device

Takeshi Taniguchi、Takashi Kinoshita、Koichi Ikeda (1.Sony Corporation, Semiconductor Network Company, Technology Development Group、2.Emerging Devices Division, MEMS Department)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-7-1] Modified Gate Re-oxidation Technology for High Performance Embedded DRAM by Self-Adjusted Gate Bird's Beak

Y. Nishida、S. Ueno、T. Uchida、T. Terauchi、T. Tsunomura、M. Takeuchi、M. Shirahata、T. Eimori、Y. Inoue (1.ULSI Development Center, Mitsubishi Electric Corporation)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-7-2] Improvement of Disturbance/Pause Retention Time by Reducing Edge Channel Effect of Cell in Gigabit Density DRAMs and beyond

Il-Gweon Kim、Nam-Sung Kim、Young-Woo Kwon、Se-Kyung Choi、Jae-Soon Kwon、Young-Il Chun、Hee-Sik Yang、 Jooseog-Park (1.Memory R&D Division, Hynix Semiconductor Co., Ltd)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-7-3] Impact of Burn-In Stress on Reliability of High Density DRAMs

Il-Gweon Kim、Jun-Hyun Chun、Nam-Sung Kim、Young-Woo Kwon、Se-Kyoung Choi、Joo-Seog Park (1.Memory R&D Division, Hynix Semiconductor Inc.)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-7-4] Field-Shield Trench Isolation with Self-Aligned Field Oxide

Akihiro Takase、Toshirou Kidera、Hideo Sunami (1.Hiroshima University, Research Center for Nanodevices and Systems)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-8-1] Voltage Acceleration of Ultra-Thin Gate Oxide Degradation before and after Soft Breakdown

Takuji Hosoi、Shigeyasu Uno、Yoshinari Kamakura、Kenji Taniguchi (1.Dept. of Electronics and Information Systems, Graduate School of Eng., Osaka Univ.)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-8-2] Oxide Soft Breakdown Effects on Drain Current Flicker Noise in Ultra-Thin Oxide CMOS Devices

Jun-Wei Wu、Hung-Chih Chang、Tahui Wang (1.Dept. of Electronics Engineering, National Chiao-Tung University)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

[A-8-3] Novel Deuterated Highly Reliable SiO2 by SiD4 Poly-Si Gate Electrode

Yuichiro Mitani、Hideki Satake (1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation)

2002 International Conference on Solid State Devices and Materials |PDF ダウンロード

428件中(341 - 350)

« 前へ
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
26
27
28
29
30
31
32
33
34
35
36
37
38
39
40
41
42
43
次へ »

▲