[PS-4-23] Effect of Post-metallization Annealing on Interface Properties of Al2O3/GaN Fabricated on c- and m-plane Free-standing GaN Substrates
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
779件中(611 - 620)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)
2019 International Conference on Solid State Devices and Materials
|2019年9月4日(水)