[PC-5-3] The Behavior of Alkoxy-Functional Groups on Atmospheric-Pressure Chemical Vapor Deposition Using Alkoxysilane and Ozone

Koichi IKEDA、Masahiko MAEDA (1.NTT LSI Laboratories)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-5-4] Low Dielectric Constant Fluorinated Oxide Films Prepared by Remote Plasma Chemical Vapor Deposition

Seung Min LEE、Min PARK、Kyu Chang PARK、Jong Tae BAEK、Jin JANG (1.Department of Physics, Kyung Hee University、2.Semiconductor Division, Electronics and Telecommunications Research Institute)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-5-5] Densified SiOF Film Formation for Preventing Water Absorption

Hiroshi KUDO、Rika SHINOHARA、Shunsaku TAKEISHI、Naoki AWAJI、Masao YAMADA (1.Thin Film Technology Dept., Process Dev. Div., Fujitsu LTD.、2.Electron Devices and Materials Lab., Fujitsu Lab., LTD.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-5-6] Elimination of Al Line and Via Resistance Degradation under HTS Test in the Application of F-Doped Oxide as Intermetal Dielectrics

B. K. Hwang、J. H. Choi、S. W. Lee、K. Fujihara、U. I. Chung、S. I. Lee、M. Y. Lee (1.Semiconductor R&D Center, Samsung Electronics, Co Ltd.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-5-7] The Origin of Micro-Loading Effect of TEOS-O3 Oxide II

U-In Chung、Myoung-Beom Lee、In-Seon Park、Sang-In Lee、Moon-Yong Lee (1.Semiconductor R&D Center, Samsung Electronics Co.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-5-8] Thermal Stability of Amophous Ion Beam Sputtered Refractory Oxides for AR/HR DFB Coatings and Low Loss Optical Waveguide Purposes

B. Kempf、H. W. Dinges (1.Deutsche Bundespost Telekom, Forschungs- und Technologiezentrum)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-6-1] Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Implants into Polysilicon Emitters

Shuji Ito、Satoshi Nishikawa (1.Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-6-2] The Cleaning of Particle and Metallic Impurity on Si Wafer Surface by Fluorine Etchant

H. Izumi、M. Nose、S. Ojima、K. Kubo、T. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-6-3] Surface Observation and Modification of Si Substrate in Solutions

Atsushi ANDO、Kazushi MIKI、Kazuhiko MATSUMOTO、Tetsuo SHIMIZU、Yukinori MORITA、Hiroshi TOKUMOTO (1.Electrotechnical Laboratory (ETL)、2.National Institute for Advanced Interdisciplinary Research (NAIR))

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[PC-6-4] Oxidation Processes on H-Terminated Si(100) Surfaces Studied by High-Resolution Electron Energy Loss Spectroscopy

Hiroya IKEDA、Khoji HOTTA、Shinya FURUTA、Shigeaki ZAIMA、Yukio YASUDA (1.Department of Crystalline Materials Science, School of Engineering, Nagoya University)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

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