[B-5-4] PMOS Thin-Film Transistors Fabricated in RTCVD Polycrystalline Silicon Germanium Films

Seo-Kyu Lee、Hyung-Geun Kim、Wook-Jin Chung、B. K. Kang、Ohyun Kim (1.Department of Electronic and Electrical Engineering, Pohang University of Science and Technology、2.Research Institute of Industrial Science and Technology、3.LG Semiconductor Co. Ltd.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-1] Sub-0.2um Silicon-On-Insulator (SOI) CMOS: Opportunities and Challenges

Lisa T. Su (1.IBM T.J. Watson Research Center and Semiconductor Research and Development Center (SRDC))

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-2] Formation of SiGe Source/Drain Using Ge Implantation for Floating-Body Effect Resistant SOI MOSFETs

A. Nishiyama、O. Arisumi、M. Terauchi、M. Yoshimi、S. Takeno、K. Suzuki (1.ULSI Research Laboratories, R & D Center, Toshiba Corp.、2.Environmental Engineering Laboratory, R & D Center, Toshiba Corp.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-3] Vth Rolloff Free Sub 0.1 μm SOI MOSFETs Using Counter Doping into a Uniformly and Heavily Doped Channel Region

Akira Satoh、Kunihiro Suzuki、Toshihiro Sugii (1.Fujitsu Laboratories Ltd.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-4] Improvement of Breakdown Voltage in SOI MOSFET Using Gate-Recess (GR) Structure

Jin-Hyeok Choi、Young-June Park、Hong-Shick Min (1.Dept. of Electronics Eng. and Inter-University Semiconductor Research Center Seoul National University)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-5] Characterization of SOI Substrates for ULSI Applications

Sorin CRISTOLOVEANU (1.Laboratoire de Physique des Composants a Semiconducteurs (UA-CNRS & INPG), ENSERG)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-6] The Status and Future of Low-Dose SIMOX Technology

Masato IMAI、Tatsuhiko KATAYAMA、Jaroslaw JABLONSKI (1.Komatsu Electronic Metals Co., Ltd.)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-7] A High Performance 0.05μm MOSFET with Thin SOI/Buried Oxide Structure

Kazuya OHUCHI、Ryuji OHBA、Hiromi NIIYAMA、Kazuaki NAKAJIMA、Tomohisa MIZUNO (1.Semiconductor Device Engineering Laboratory, ULSI Research Laboratories, TOSHIBA Corporation)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-8] Two-Dimensionally Confined Carrier Injection Phenomena in Sub-10-nm-Thick SOI Insulated-Gate pn-Junction Devices

Yasuhisa OMURA (1.NTT LSI Laboratories)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

[S-III-9] Process Technology of Bonded SOI Wafers: Recent Development and Quality

Kiyoshi MITANI (1.Isobe R&D Center, Shin-Etsu Handotai)

1995 International Conference on Solid State Devices and Materials |PDF ダウンロード

375件中(181 - 190)

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