Si Metal-Oxide-Semiconductor System by Remote Plasma Nitridation of Al2O3 Surface

Heung-Jae Cho、Dae-Gyu Park、Kwan-Yong Lim、Jung-Kyu Ko、In-Seok Yeo、Jin Won Park、Hee-Koo Yoon (1.Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-10-1] Synthesis of Fluorinated SiNx Gate Dielectric Films Using ECR-PECVD Employing SiF4/N2/H2 Gases

Reiji Morioka、Hiroyuki Ohta、Masaru Hori、Toshio Goto (1.Department of Quantum Engineering, School of Engineering, Nagoya University)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-10-2] Precursor Control in ZrO2-CVD for Better Characteristics as High-k Gate Application

T. Kawamoto、Y. Simogaki (1.Department of Materials Engineering, University of Tokyo)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-10-3] Characterization of Oxygen Vacancies in SrTiO3 Thin Films by Auger Electron Spectroscopy and Its Application to Leakage Current Reduction of Ru/SrTiO3/Ru Capacitor

S. Niwa、S. Yamazaki、M. Kiyotoshi、J. Nakahira、M. Nakabayashi、C. M. Chu、K. Eguchi (1.Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation、2.ULSI Technology Development Division, Fujitsu Limited、3.DRAM Process Integration and Module Technology Department, Winbond Electronics Corporation)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[B-10-4] The Atomistic Origin of High Dielectric Constants of Ta2O5 Thin Film Deposited on Ru Electrodes

Tomoyuki Hamada、Takuya Maruizumi、Masahiko Hiratani (1.Advanced Research Laboratory, Hitachi Ltd.、2.Central Research Laboratory, Hitachi, Ltd.)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[C-7-1] Key Issues for Manufacturable FeRAM Devices Novel 0.35um FRAM Technology using Triple Level Aluminum Layer for High Speed and Low Voltage Operation

Tatsuya Yamazaki (1.FUJITSU Ltd.)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[C-7-3] Si-Dot Non-Volatile Memory Device

J. De Blauwe、M. Ostraat (1.Agere Systems)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[C-8-1] Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded LSIs and 1Tr FeRAM Devices

Koji Yamakawa、Keitaro Imai、Osamu Arisumi、Tsunetoshi Arikado、Masaki Yoshioka、Tatsushi Owada、Katsuya Okumura (1.Process & Manufacturing Engineering Center, Toshiba Corp., Semiconductor Company、2.Lamp Technology & Engineering Division, Ushio Inc.)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[C-8-2] Novel Capacitor Technology for Sub-Quarter Micron 1T1C FRAM

Y. J. Song、N. W. Jang、D. J. Jung、H. H. Kim、H. J. Joo、S. Y. Lee、K. M. Lee、S. H. Joo、S. O. Park、Kinam Kim (1.Technology Development Team, R&D Center, Memory Devices, Samsung Electronics Co. Ltd.)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード

[C-8-3] Modeling of Polarization Relaxation Effects in Ferroelectric Memory

C. W. Tsai、S. Y. Lee、S. L. Lung、T. Wang (1.Macronix International Co.、2.Dept. of Electronics Engineering, National Chiao-Tung University)

2001 International Conference on Solid State Devices and Materials |PDF ダウンロード