The Japan Society of Applied Physics

540件中(361 - 370)

[PS-3-10] Investigation of Low-Frequency Noise in High-k First/Metal Gate Last HfO2 and ZrO2 nMOSFETs

S.L. Wu1、B.C. Wang2、Y.Y. Lu1、S.C. Tsai2、J.F. Chen2、S.J. Chang2,3、S.P. Chang2,3、C.H. Hsu4、C.W. Yang4、C.G. Chen4、O. Cheng4、P.C. Huang2,3 (1.Cheng Shiu Univ.、2.Inst. of Microelectronics and Department of Electrical Engineering, National Cheng Kung Univ.、3.Advanced Optoelectronic Tech. Center, National Cheng Kung Univ.、4.United Microelectronics Corp. (Taiwan))

2014 International Conference on Solid State Devices and Materials |PDF ダウンロード

540件中(361 - 370)