[C-8-4] Improved Retention Characteristics of Metal-Ferroelectric-Insulator-Semiconductor Structure Using a Post-Oxygen Annealing Treatment
2001 International Conference on Solid State Devices and Materials |PDF Download
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2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download
2001 International Conference on Solid State Devices and Materials |PDF Download