The Japan Society of Applied Physics

[D-3-1] Scalable La-silicate Gate Dielectric on InGaAs Substrate with High Thermal Stability and Low Interface State Density

D.H. Zadeh1、H. Oomine1、K. Kakushima2、Y. Kataoka2、A. Nishiyama2、N. Sugii2、H. Wakabayashi2、K. Tsutsui1、K. Natori1、H. Iwai1 (1.Frontier Research Center, Tokyo Inst. of Tech.、2.Interdisciplinary Graduate School of Science and Engineering, Tokyo Inst. of Tech. (Japan))

2013 International Conference on Solid State Devices and Materials |PDF ダウンロード