Oral presentation

[14a-213-1~12] 6.4 Thin films and New materials

Tue. Mar 14, 2017 9:00 AM - 12:15 PM 213 (213)

Tamio Endo(Sagamihara Surface Lab.), Akifumi Matsuda(Titech)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

▲ [14a-213-1] Pulsed laser deposition and characterization of NbON epitaxial thin films

〇(D)Vitchaphol Motaneeyachart¹, Yasushi Hirose^1,2, Atsushi Suzuki¹, Shoichiro Nakao², Tetsuya Hasegawa^1,2 (1.Univ. of Tokyo, 2.KAST)

9:15 AM - 9:30 AM

▲ [14a-213-2] Synthesis of Molybdenum Disulfide Ribbons by Chemical Vapor Deposition in Sulfur Enriched Condition

〇Rakesh Dayaram Mahyavanshi¹, Golap Kalita¹, Masaki Tanemura¹ (1.Nagoya Inst. of Tech)

9:30 AM - 9:45 AM

▲ [14a-213-3] Deposition of Yttria Stabilized Zirconia (YSZ) Film on ZEOCOAT^® Layer by Reactive Sputtering

〇(D)Mayeesha Masrura Haque¹, Susumu Horita¹ (1.Japan Adv. Inst. Sci. & Tech. (JAIST))

10:00 AM - 10:15 AM

[14a-213-4] The interference among the multi-reflected SH light beams generated by monolayer transition metal dichalcogenides on a SiO₂/Si(001) substrate

Yuhei Kikuchi¹, 〇Yoshihiro Miyauchi², Ryo Morishita¹, Masatoshi Tanaka¹, Shinya Ohno¹, Takanori Suzuki^2,1 (1.Yokohama Nat. Univ., 2.Nat. Def. Acad.)

10:15 AM - 10:30 AM

[14a-213-5] Growth of antiperovskite-type oxides Ca₃SnO thin film by pulsed laser deposition

〇Makoto Minohara¹, Ryu Yukawa¹, Hiroshi Kumigashira¹ (1.KEK)

10:30 AM - 10:45 AM

[14a-213-6] Electrical and Magnetic Properties of Antiperovskite Manganese Nitride Thin Films

〇Toshiki Matsumoto¹, Takahiro Urata¹, Takafumi Hatano¹, Kazumasa Iida¹, Hiroshi Ikuta¹ (1.Nagoya Univ.)

10:45 AM - 11:00 AM

[14a-213-7] Heteroepitaxial Growth of ScN Films Grown on R-sapphire Substrates

〇Takeshi Ohgaki¹, Isao Sakaguchi¹, Naoki Ohashi¹, Hajime Haneda¹ (1.National Institute for Materials Science)

11:00 AM - 11:15 AM

[14a-213-8] XPS study of GaGdAs:Si multilayer

〇Tsubasa Sano¹, Kato Shou¹, Miyagawa Hayato¹, Takahashi Naoshi¹ (1.Kagawa Univ.)

11:15 AM - 11:30 AM

[14a-213-9] Magnetic and Electric Properties of [(CaFeO_x)_n/(LaFeO₃)_n]_m

〇Shohei Ohashi¹, Hirotaka Matuyama¹, Takanori Akazawa¹, Tomoyuki Koyama¹, Chun Wang¹, Qi Zhang¹, Huaping Song¹, Tomoko Nagata¹, Hiroshi Yamamoto¹, Nobuyuki Iwata¹ (1.Nihon Univ.)

11:30 AM - 11:45 AM

[14a-213-10] Fabrication and Structure Analysis of (Cr_1-xFe_x)₂O₃ Films and Cr₂O₃/Fe₂O₃ Bilayer Films grown by Sputtering Method

〇Shinjiro Fukui¹, Takashi Sumida¹, Kosuke Hashimoto¹, Tsuyoshi Hirato¹, Yasuhiro Yanagihara¹, Tomoko Nagata¹, Hiroshi Yamamoto¹, Nobuyuki Iwata¹ (1.CST, Nihon Univ.)

11:45 AM - 12:00 PM

[14a-213-11] Characterization of Sr₂SiO₄ thin film deposited on Si(100) substrate by FT-IR

〇Shota Taniwaki¹, Mitsuhiro Umano¹, Koji Arafune¹, Haruhiko Yoshida¹, Shin-ich Satoh¹, Yasushi Hotta¹ (1.Univ. of Hyogo)

12:00 PM - 12:15 PM

[14a-213-12] Influence of annealing conditions on properties of In-Ga-O semiconductor thin film deposited by sputtering with H₂O introduction

〇Tokuyuki Nakayama¹, Toshio Morimoto¹, Mana Shiraki¹, Fumihiko Matsumura¹, Takuya Odakura², Kousaku Shimizu² (1.Sumitomo Metal Minig, 2.Nihon Univ.)

Oral presentation

[14p-213-1~14] 6.4 Thin films and New materials

Tue. Mar 14, 2017 1:45 PM - 6:30 PM 213 (213)

Tetsuo Tsuchiya(AIST), Suzuki Muneyasu(AIST)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:45 PM - 2:30 PM

[14p-213-1] [INVITED] Discovery of Indium Gallium Zinc Oxide (CAAC/CAC-OS) and Application

〇Shunpei Yamazaki¹ (1.SEL)

2:30 PM - 3:15 PM

[14p-213-2] [INVITED] Creation of Organic Semiconductor Single-crystalline Thin Films Having High Carrier Mobility

〇Toshihiro Okamoto^1,2 (1.Univ. of Tokyo, 2.JST-PRESTO)

3:15 PM - 3:30 PM

[14p-213-3] Experimental and MD simulation study of ionic conduction behavior in ionic liquid nano thin films

〇Shingo Maruyama¹, Ida Prastiawan², Kaho Toyabe¹, Yuji Higuchi², Momoji Kubo², Matsumoto Yuji¹ (1.Tohoku Univ., 2.IMR Tohoku Univ.)

3:30 PM - 3:45 PM

[14p-213-4] RHEED and ARPES Studies of MoS₂ Film Formed by Sputtering Method

〇Masatoshi Yoneda¹, Takeda Sakura¹, Taguchi Munetaka¹, Matsuda Hiroyuki¹, Ohashi Takumi², Shimizu Junichi², Ang Artoni Kevin¹, Hashimoto Yusuke¹, Fukami Shun¹, Tanaka Ikko¹, Okamoto Takashi¹, Ebato Tatsuya¹, Daimon Hiroshi¹, Wakabayashi Hitoshi², Kinoshita Toyohiko³ (1.Nara Inst., 2.Tokyo Tech., 3.JASRI)

3:45 PM - 4:00 PM

[14p-213-5] Reductive fluorination of SrCeO₃ thin film using polyvinylidene fluoride

〇Takaaki Shiina¹, Akira Chikamatsu¹, Makoto Minohara², Hiroshi Kumigashira², Tetsuya Hasegawa^1,3 (1.Univ. of Tokyo, 2.KEK-PF, 3.KAST)

4:00 PM - 4:15 PM

[14p-213-6] First-principles study of layered ruthenium oxyfluoride Sr₂RuO₃F₂

〇Yuji Kurauchi¹, Hideyuki Kamisaka¹, Akira Chikamatsu¹, Tetsuya Hasegawa^1,2 (1.Univ. Tokyo, 2.KAST)

4:30 PM - 4:45 PM

[14p-213-7] Occurrence of recrystallization phenomenon and the growth of μm-sized VO₂grainsby substrate biasing in reactive sputtering

〇Kohei Matsuoka¹, Nurul Hanis Azhan¹, Kunio Okimura¹ (1.Tokai Univ.)

4:45 PM - 5:00 PM

[14p-213-8] Preferred orientation and surface structures of Pt films grown on SrTiO₃(100)

〇Masahiro Kasai¹, Hideyuki Dohi¹ (1.Kyushu univ.)

5:00 PM - 5:15 PM

[14p-213-9] Specific adsorption of glycine depending on annealing temperature of Al₂O₃(0001)

〇Ayaka Saito¹, Hiroaki Nishikawa² (1.Grad. Sch. B.O.S.T., Kindai Univ., 2.Fac. B.O.S.T., Kindai Univ)

5:15 PM - 5:30 PM

[14p-213-10] Relationship between Pulse Repetition Rate of Laser and Surface Morphology of Hydroxyapatite Thin Films Deposited Using Pulsed Laser Deposition

〇Shinji Umatani¹, Hiroaki Nishikawa¹ (1.B.O.S.T., Kindai Univ.)

5:30 PM - 5:45 PM

[14p-213-11] Water Sealing by Chelate Flame Method for Cement Hardened Body

〇Keita Abe¹, Atsushi Nakamura^2,1, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

5:45 PM - 6:00 PM

[14p-213-12] Water Permeability on Cement Hardened Body Fabricated by Chelate Firing Method

〇Keita Abe¹, Atsushi Nakamura^2,1, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

6:00 PM - 6:15 PM

[14p-213-13] Sealing treatment of Gd-doped CeO₂ synthesized
by chelate flame method

〇Shota Nakamura¹, Atsushi Nakamura^1,2, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

6:15 PM - 6:30 PM

[14p-213-14] Synthesis of Gd-doped CeO₂ film combining chelate flame method with chelate firing method

〇Shota Nakamura¹, Atsushi Nakamura^1,2, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

Poster presentation

[15a-P5-1~9] 6.4 Thin films and New materials

Wed. Mar 15, 2017 9:30 AM - 11:30 AM P5 (BP)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 11:30 AM

[15a-P5-1] Al₂O₃ films for anticorrosion coating on metal surfaces by room temperature atomic layer deposition

〇Kensaku Kanomata¹, Makoto Ishikawa¹, Masanori Miura¹, Bashir Ahmmad¹, Shigeru Kubota¹, Kazuhiro Hirahara¹, Fumihiko Hirose¹ (1.Yamagata Univ.)

9:30 AM - 11:30 AM

[15a-P5-2] The control of the crystal phase and characteristics in MoO_X thin films by the post-annealing under uniaxial compression

〇Ryotaro Nanba¹, Nobuo Tsuchimine², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech., 2.TOSHIMA Manu. Co., Ltd., 3.Kanagawa Ind. Tech. Center)

9:30 AM - 11:30 AM

[15a-P5-3] Preparation of the antimicrobial thin film using vacuum evaporation

〇Takashi Inomata¹ (1.KISAN KINZOKU)

9:30 AM - 11:30 AM

[15a-P5-4] Polarized luminescence property of non-polar ZnO thin films deposited by a catalytic reaction-assisted CVD method

〇Kanji Yasui¹, Ryouichi Tajima¹, Munenori Ikeda¹, Yudai Adachi¹, Ariyuki Kato¹ (1.Nagaoka Univ. Technol.)

9:30 AM - 11:30 AM

[15a-P5-5] Fabrication of Alq₃ tin films by mist vapor evaporation

〇(B)Tatsuki Matsushima¹, Shigetaka Katori¹, Masaya Oda², Toshimi Hitora² (1.National Institute of Technology, Tsuyama College, 2.FLOSFIA INC.)

9:30 AM - 11:30 AM

[15a-P5-6] Perfect Separation between Hybrid Orientation CeO₂ Regions on SOI Substrates

〇Tomoyasu Inoue¹, Shigenari Shida¹ (1.Iwaki Meisei Univ.)

9:30 AM - 11:30 AM

[15a-P5-7] Fabrication and characterization of BiVO₄ thin films using wet deposition method

〇(B)Yusuke Ohata¹ (1.Ryukoku Univ.)

9:30 AM - 11:30 AM

[15a-P5-8] The relation of formation and vaporizing temperature of ZnO whisker using atmospheric chemical vapor deposition

〇Naoki Kakuda¹, Keiji Komatsu², Hidetoshi Saitoh² (1.NIT, Yonago Colege, 2.Nagaoka Univ. Tech.)

9:30 AM - 11:30 AM

[15a-P5-9] Study on CBRAM using MOF thin film for memory layer

〇Yuki Nishimura¹, Takuya Nakamichi¹, Hiroshi Kajiro², Kentaro Kinoshita^1,3 (1.Tottori Univ, 2.Nippon Steel & Sumitomo Metal Co, 3.TiFREC)

Oral presentation

[15p-311-1~18] 6.4 Thin films and New materials

Wed. Mar 15, 2017 1:15 PM - 6:15 PM 311 (311)

Kentaro Shinoda(AIST), Yoshinobu Nakamura(Univ. of Tokyo), Kyoko Namura(Kyoto Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:15 PM - 1:30 PM

[15p-311-1] [JSAP Young Scientist Award Speech] Magnetic properties of iron cluster-containing amorphous silicate thin films

〇Yuko Nakatsuka¹, Kilian Pollok², Falko Langenhorst², Lothar Wondraczek², Shunsuke Murai¹, Koji Fujita¹, Katsuhisa Tanaka¹ (1.Kyoto Univ., 2.Univ. of Jena)

1:30 PM - 1:45 PM

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase Sr_nNb_nO_3n+2

〇(B)Yukio Nezu¹, Chunlin Chen², Yuichi Ikuhara³, Hiromichi Ohta⁴ (1.Hokkaido Univ., 2.AIMR-Tohoku Univ., 3.U. Tokyo, 4.RIES-Hokkaido Univ.)

1:45 PM - 2:00 PM

△ [15p-311-3] Epitaxial Mn₃GaN Thin Films Grown by Pulsed Laser Deposition

〇Ryo Miyamoto¹, Kouki Kanazawa¹, Ataru Ichinose², Takahiro Urata¹, Takahumi Hatano¹, Kazumasa Iida¹, Hiroshi Ikuta¹ (1.Nagoya Univ., 2.CRIEPI)

2:00 PM - 2:15 PM

△ [15p-311-4] Epitaxial growth of CaFe₂O₄ films on TiO₂ (100) surface

〇Nana Nishiyama¹, Hisanori Mashiko¹, Kohei Yoshimatsu¹, Koji Horiba², Hiroshi Kumigashira^2,3, Akira Ohtomo¹ (1.Tokyo Tech., 2.KEK-PF, 3.MCES.)

2:15 PM - 2:30 PM

△ [15p-311-5] Fabrication of V₂O₅-Bi₂O₃-WO₃glass thin film by pulsed laser deposition and optical and electrical characterization

〇Yuki Fujimoto¹, Shiori Takano¹, Satoru Kaneko², Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech., 2.Kanagawa Ind. Tech. Cent.)

2:45 PM - 3:00 PM

△ [15p-311-6] Fabrication of TiH₂ thin films using hydrogen-radical assisted pulsed-laser deposition

〇(B)Akito Nishi¹, Kohei Yoshimatsu¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

3:00 PM - 3:15 PM

△ [15p-311-7] Epitaixial growth of niobium hydride using reactive magnetron sputtering

〇(B)Yuki Sasahara¹, Ryota Shimizu¹, Issei Sugiyama¹, Hiroyuki Oguchi², Susumu Shiraki², Shinichi Orimo^2,3, Taro Hitosugi^1,2 (1.Tokyo Tech, 2.Tohoku Univ. AIMR, 3.Tohoku Univ. IMR)

3:15 PM - 3:30 PM

△ [15p-311-8] Epitaxial growth of single-phase magnesium dihydride using reactive magnetron sputtering

〇(B)Takuya Kakinokizono¹, Ryota Shimizu¹, Issei Sugiyama¹, Hiroyuki Oguchi², Shin-ichi Orimo^2,3, Taro Hitosugi^1,2,4 (1.Tokyo Tech, 2.Tohoku Univ. AIMR, 3.Tohoku Univ. IMR, 4.JST-CREST)

3:30 PM - 3:45 PM

△ [15p-311-9] In Situ Temperature Measurement of Crystallization Process of Tin Oxide Films in ELAMOD Process at Nano Second Time Scale

〇Tsukasa Katsuki¹, Tetsuo Tsuchiya², Jun Akedo², Atsushi Yumoto¹, Kentaro Shinoda² (1.Shibaura Inst. Tech., 2.AIST)

3:45 PM - 4:00 PM

△ [15p-311-10] Influence of template patterns on the self-assembled nanostructures of oxide thin films toward oxide DSA

〇Geng Tan¹, MingYu Li¹, Osamu Nakagawara², Azusa Hattori¹, Hidekazu Tanaka¹ (1.ISIR, Osaka Univ., 2.Murata Manufacturing Co., Ltd.)

4:00 PM - 4:15 PM

△ [15p-311-11] Graphoepitaxial growth of In₂O₃ by quasi-VLS method on V-groove patterned substrates

〇Tokohei Go¹, Kohei Yoshimatsu¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

4:30 PM - 4:45 PM

[15p-311-12] Low Refractive Index MgF₂ Optical Thin Films by Sputtering and Electron Beam Evaporation

〇Yoshiki Tsuno¹, Naoya Tajima², Hiroshi Murotani¹, Shigeharu Matsumoto³ (1.Sch. of Eng., Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ., 3.SHINCRON Co., Ltd.)

4:45 PM - 5:00 PM

[15p-311-13] Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation

〇(B)Reika Ihara¹, Naoya Tajima², Hiroshi Murotani¹, Shigeharu Matsumoto³ (1.Sch. of Eng., Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ., 3.SHINCRON Co., Ltd.,)

5:00 PM - 5:15 PM

[15p-311-14] Growth of AlBN films deposited by CAPD and application to hard coating

〇Tomohiro Yoshida¹, Kouki Murasawa², Tsuyoshi Yoshitake³ (1.Fukuoka Industrial Technology Center, 2.OSG Corp., 3.Kyushu Univ.)

5:15 PM - 5:30 PM

[15p-311-15] Research of the deposition process by CeO₂ optical thin films (Ⅲ)

〇Saki Narita¹, Hiroshi Murotani¹, Tatsuji Amano², Shigeki Oka² (1.Grad. Sch. of Eng., Tokai Univ., 2.NIDEK CO., LTD.)

5:30 PM - 5:45 PM

[15p-311-16] Influence of Surface Roughness of Aluminum Alloy on Yttria Film by Chelate Flame Method

〇Takashi Costa¹, Atsushi Nakamura², Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ.Tech., 2.Chubu Chelest Co.,Ltd.)

5:45 PM - 6:00 PM

[15p-311-17] Crack analysis of LaSr₃Fe₃O_9.9 films deposited by chelate firing method

〇Yu Wang¹, Keiji Komatsu¹, Atsushi Nakamura^1,2, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

6:00 PM - 6:15 PM

[15p-311-18] Deposition of Dense ZrO₂ Films by Chelate Flame Method

〇Yutaka Ikeda¹, Atsushi Nakamura^1,2, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

Sessions

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[14a-213-1~12] 6.4 Thin films and New materials

▲ [14a-213-1] Pulsed laser deposition and characterization of NbON epitaxial thin films

▲ [14a-213-2] Synthesis of Molybdenum Disulfide Ribbons by Chemical Vapor Deposition in Sulfur Enriched Condition

▲ [14a-213-3] Deposition of Yttria Stabilized Zirconia (YSZ) Film on ZEOCOAT® Layer by Reactive Sputtering

[14p-213-1~14] 6.4 Thin films and New materials

[15a-P5-1~9] 6.4 Thin films and New materials

[15p-311-1~18] 6.4 Thin films and New materials

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase SrnNbnO3n+2

△ [15p-311-3] Epitaxial Mn3GaN Thin Films Grown by Pulsed Laser Deposition

△ [15p-311-4] Epitaxial growth of CaFe2O4 films on TiO2 (100) surface

△ [15p-311-5] Fabrication of V2O5-Bi2O3-WO3 glass thin film by pulsed laser deposition and optical and electrical characterization

△ [15p-311-6] Fabrication of TiH2 thin films using hydrogen-radical assisted pulsed-laser deposition

△ [15p-311-7] Epitaixial growth of niobium hydride using reactive magnetron sputtering

△ [15p-311-8] Epitaxial growth of single-phase magnesium dihydride using reactive magnetron sputtering

△ [15p-311-9] In Situ Temperature Measurement of Crystallization Process of Tin Oxide Films in ELAMOD Process at Nano Second Time Scale

△ [15p-311-10] Influence of template patterns on the self-assembled nanostructures of oxide thin films toward oxide DSA

△ [15p-311-11] Graphoepitaxial growth of In2O3 by quasi-VLS method on V-groove patterned substrates

Authentication

▲ [14a-213-3] Deposition of Yttria Stabilized Zirconia (YSZ) Film on ZEOCOAT^® Layer by Reactive Sputtering

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase Sr_nNb_nO_3n+2

△ [15p-311-3] Epitaxial Mn₃GaN Thin Films Grown by Pulsed Laser Deposition

△ [15p-311-4] Epitaxial growth of CaFe₂O₄ films on TiO₂ (100) surface

△ [15p-311-5] Fabrication of V₂O₅-Bi₂O₃-WO₃glass thin film by pulsed laser deposition and optical and electrical characterization

△ [15p-311-6] Fabrication of TiH₂ thin films using hydrogen-radical assisted pulsed-laser deposition

△ [15p-311-11] Graphoepitaxial growth of In₂O₃ by quasi-VLS method on V-groove patterned substrates