[A-4-5] Well-Resolved Band-Edge Photo- and Electro-Luminescence in Strained Si1-xGex Quantum Wells and Superlattices

J. C. Sturm, Q. Mi, H. Manoharan, X. Xiao, P. V. Schwartz (1.Department of Electrical Engineering/Princeton Optoelectronic Materials Center Princeton University)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-5-1] Silicon Nanoelectronics: The Road Less Travelled

T. P. Smith III (1.IBM Research Division, Thomas J. Watson Research Center)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-5-2] The Growth and Applications of Si1-xGex Alloys in a Si-based Technology

S. S. IYER (1.IBM Research Division, Thomas J. Watson Research Center)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-5-3] AC Characteristics of Super Self-Aligned Si HBTs with SiCx Emitter

Mamoru UGAJIN, Mamoru KUWAGAKI, Shinsuke KONAKA (1.NTT LSI Laboratories)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-5-4] A 0.3μm BiCMOS Technology with Highly Self-Aligned Structures for Deep Submicron ULSIs

Shoji Shukuri, Yasuo Onose, Nagatoshi Ohki, Takashi Nishida, Mitsuru Hirao, Eiji Takeda (1.Central Research Laboratory, Hitachi Ltd., 2.Hitachi Research Laboratory, Hitachi Ltd., 3.Hitachi VLSI Engineering Corp.)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-6-1] Fabrication of Double-Gate Thin-Film SOI MOSFETs Using Wafer Bonding and Polishing

H. Horie, S. Ando, T. Tanaka, M. Imai, Y. Arimoto, S. Hijiya (1.Fujitsu Laboratories Ltd.)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-6-2] Wafer Bonding and Thinning for High-Speed SOI Epitaxial-Base Tansistors

Atsushi FUKURODA, Toru MIYABO, Manabu KOJIMA, Tetsu FUKANO, Naoshi HIGAKI, Tatsuya YAMAZAKI, Toshihiro SUGII, Yoshihiro ARIMOTO, Takashi ITO (1.Fujitsu Laboratories Ltd.)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-6-3] A Novel Fabrication Technique of Multi-Layer-Stacked SOI Structures Applicable to 3D-ICs

K. Kawai, S. Nakanishi, H. Ogata, T. Yamaji, N. Oda, K. Yoneda (1.ULSI research Center, Sanyo Electric Co., Ltd.)

1991 International Conference on Solid State Devices and Materials |PDF Download

[A-6-4] Leakage Current Reduction in Sub-Micron Channel Poly-Si TFTs

H. Kitajima, Y. Suzuki, S. Saito (1.Microelectronics Research Laboratories, NEC Corporation)

1991 International Conference on Solid State Devices and Materials |PDF Download

[S-D-1] Growth and Properties of LPCVD TiN for ULSI

Arthur Sherman (1.Varian Research Center)

1991 International Conference on Solid State Devices and Materials |PDF Download

262 results (51 - 60)

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