[P-1-21L] Characterization of Strain Relaxation Process during Ge Condensation by Synchrotron Microbeam X-ray Diffraction
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
587件中(431 - 440)
[P-2-1] Stress Depth Profiling of Silicon from Nickel / Silicon Interface before and after Silicide Formation using Polychromator-based Multi-wavelength Raman Spectroscopy
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-2] Raman Spectroscopic Stress Analysis of Single Crystal Silicon (001) Specimen Tensioned Along the [100] Direction over 1000 MPa
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-3] Direct Observation of Tensile Stress in Silicon Oxide Films using Cathodoluminescence Spectroscopy
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-4] Si-H Group Elimination Effect on the Properties of SiOCH Films: Theoretical Investigation
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-5] A Molecular Dynamics Method for Atomic Models for Amorphous Material: an Example with SiO2
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-6] Vapor Phase Silylation Hardening Process for Porous Silica Low-k Films
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-7] Cu Electroplating Process with Magnetic Field for Flexible Device
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-8] Copper Plug Barrier Process Optimization for Reliable Transistor Performance
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード
[P-2-9] Experiments and Simulation of Stress Induced Voiding Dependence on Upper Metal Cap Layer in Cu/Low K Interconnects
2008 International Conference on Solid State Devices and Materials |PDF ダウンロード