High k Dielectrics, Al2O3 for SONOS Type Flash Memory

Changhyun Lee, Sunghoi Hur, Youcheol Shin, Jeonghyuk Choi, Donggun Park, Kinam Kim (1.Advanced Technology Development Team, Semiconductor R&D Center, Memory Business, Samsung Electronics Co., Ltd.)

2002 International Conference on Solid State Devices and Materials |PDF Download

[A-6-3] Hot Carrier Enhanced Read Disturb and Scaling Effects in a Localized Trapping Storage SONOS Type Flash Memory Cell

W. J. Tsai, C. C. Yeh, N. K. Zous, C. C. Liu, S. K. Cho, C. H. Chen, Tahui Wang, Sam Pan, Chih-Yuan Lu (1.Macronix International Co., Ltd., 2.Department of Electronics Engineering, National Chiao-Tung University)

2002 International Conference on Solid State Devices and Materials |PDF Download

[A-6-4] Characterization of microFLASH R Memory using "Dummy" GOX Structures

Yakov Roizin, Micha Gutman, Efraim Aloni, Victor Kairys, Pavel Zisman (1.Tower Semiconductor Ltd.)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-3-1] Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven, H. de Waard, E. Shero, C. Pomarede, S. Marcus, J. W. Maes, Z. M. Rittersma, M. A. Verheijen (1.ASM America, Inc., 2.ASM Belgium N. V., 3.Philips Research Leuven)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-3-2] Suppression of Silicidation in ZrO2/SiOx/Si Structure by Helium Annealing

Kouichi Muraoka (1.Advanced LSI Technology Laboratory, Toshiba Corporation)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-3-3] Improvement of electrical properties for high-κ dielectrics grown by MOCVD via cyclic remote plasma oxidation

Sadayoshi Horii, Masayuki Asai, Hironobu Miya Kazuhiko Yamamoto, and, Masaaki Niwa (1.Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc., 2.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-3-4] Materials and Electrical Characterization of Metal Gate Electrodes on High-k Dielectrics for Advanced CMOS Technologies

Jacob C. Hooker, Robert J. P. Lander, Z. M. Rittersma, Tom Schram, Guilherme S. Lujan, Jeroen van Zijl, Eric van den Heuvel, Fred Roozeboom (1.Philips Research Leuven, 2.IMEC vzw, 3.Philips Research Labortories Nat. Lab.)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-4-1] Etching of Organic Low k Dielectric, their Gas Phase and Subsurface Reactions in Ultra High Frequency Plasma

Hisao Nagai, Mineo Hiramatsu, Masaru Hori, Toshio Goto (1.Nagoya University, Graduate School of Engineering, Department of Quantum Engineering, 2.Meijo University, Faculty of Science and Technology, Department of Electrical and Electronic Engineering)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-4-2] Stress-Induced Migration and Microstructural Features in Cu Metallization

J. Koike, A. Sekiguchi, M. Wada, R. Kainuma, K. Ishida, K. Maruyama (1.Dept. of Materials Science, Tohoku University)

2002 International Conference on Solid State Devices and Materials |PDF Download

[B-4-3] Chemical Structural Control of Plasma-Polymerized, Divinylsiloxane Benzocyclobutene Films for sub 100nm-node ULSI devices

Y. Harada, M. Tada, J. Kawahara, Y. Hayashi (1.Silicon Systems Research Laboratories, NEC Corporation)

2002 International Conference on Solid State Devices and Materials |PDF Download

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