[H-3-3] Conductance of Zinc Oxide Nanocontacts Studied by In Situ Transmission Electron Microscopy

T. Kase¹、T. Kizuka¹ (1.Univ. of Tsukuba , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-3-4] The Role of Aluminum Catalyst Atoms in Shaping the Structural and Electrical Properties of Epitaxial Silicon Nanowires

O. Moutanabbir¹、S. Senz¹、M. Alexe¹、Y. Kim¹、R. Scholz¹、H. Blumtritt¹、C. Wiethoff²、T. Nabbefeld²、F. J. Meyer zu Heringdorf²、M. Horn-von Hoegen²、D. Isheim³、D. N. Seidman³ (1.Max Planck Institute of Microstructure Physics、2.Univ. Duisburg-Essen , Germany、3.Northwestern Univ. , USA)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-3-5] Growth and Characterization of GaAsP Nanowires on GaAs(111)B Substrate by Selective-Area Metal Organic Vapor Phase Epitaxy

S. Fujisawa¹、T. Sato¹、S. Hara¹、J. Motohisa¹、K. Hiruma¹、T. Fukui¹ (1.Hokkaido Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-3-6] Fabrication of Rectifying Pt/TiO_x/Pt by RF-Magnetron Sputtering

N. Zhong^1,2、H. Shima^1,2、H. Akinaga^1,2 (1.AIST、2.CREST-JST , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-4-1] Thermal Transport in Graphene and Few-Layer Graphene: Applications in Thermal Management and Interconnects

A. A. Balandin¹、 in¹ (1.Univ. of California, Riverside , USA)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-4-2] Plasma Discharge Condition Dependence of the Crystallographic Quality of Networked Nanographite Grown by the Photoemission-Assisted Plasma-Enhanced CVD

S. Ogawa^1,2、T. Kaga¹、Y. Ohtomo¹、M. Sato^2,3、M. Nihei^2,3、Y. Takakuwa^1,2 (1.Tohoku Univ.、2.CREST-JST、3.Fujitsu Ltd. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-4-3] Carbon Nanotube Growth for Vias and Interconnects

J. Robertson¹、C. S. Esconjauregui¹、B. C. Bayer¹、F. Yan¹、G. Zhong¹、J. Dijon²、H. Okuna² (1.Cambridge Univ. , UK、2.CEA , France)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-5-1] Advanced Organic Polymers for the Aggressive Scaling of Low-k Materials

M. Pantouvaki¹、L. Zhao²、C. Huffman¹、N. Heylen¹、Y. Ono³、M. Nakajima³、K. Nakatani³、G. P. Beyer¹、M. R. Baklanov¹ (1.IMEC、2.Intel Corp. , Belgium、3.Sumitomo Bikelite Co., Ltd. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-5-2] DMOTMDS/MTMOS Multi-Stacked SiOCH films for Super-Low-k and Sufficient Modulus Formed by Damage-free Neutral Beam Enhanced CVD

T. Sasaki¹、S. Yasuhara¹、T. Shimayama²、K. Tajima²、H. Yano²、S. Kadomura²、M. Yoshimaru²、N. Matsunaga²、S. Samukawa¹ (1.Tohoku Univ.、2.STARC , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[H-5-3] Improvement of Variability and Reliability in Low-k/Cu Interconnects by Selectivity Control in Dry-Etching Process

I. Kume¹、M. Ueki¹、N. Inoue¹、J. Kawahara¹、N. Ikarashi¹、N. Furutake¹、S. Saitoh¹、Y. Hayashi¹ (1.Renesas Electronics Corp. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード