[B-1-1] Lithographic Technologies for 1-Gb DRAMs and Beyond

Shinji Okazaki (1.Semiconductor Development Center Semiconductor & Integrated Circuits Div. Hitachi Ltd.)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-1-2] Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure

Atsushi YAGISHITA, Tomohiro SAITO, Satoshi MATSUDA, Yukihiro USHIKU (1.Microelectronics Engineering Laboratories, Toshiba Corporation)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-1-3] RIE-Lag Reduction by NH3 Addition in Aluminum Alloy Etching under BCl3/Cl2 Chemistry

Michinari YAMANAKA, Hideo NAKAGAWA, Masafumi KUBOTA (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-1-4] Double Spacer LOCOS Process with Shallow Recess of Silicon for 0.20 μm Isolation

Byung-Jin Cho, Se-Aug Jang, Tae-Sik Song, Seung-Ho Pyi, Jong-Choul Kim (1.Memory R&D Div., HYUNDAI Electronics Ind. Co. Ltd.)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-1-5] CMP with Pad-Press Ring for Superior Uniformity Performance

Mikio Nishio, Tomoyasu Murakami, Masashi Hamanaka (1.Semiconductor Research Center, Matsushita Electric Industrial, Co., Ltd., 2.Kyoto Research Laboratory, Matsushita Electronics Corporation)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-1-6] Polysilicon Encapsulated LOCOS for Deep Submicron CMOS Lateral Isolation

Goncal Badenes, Rita Rooyackers, Ingrid De Wolf, Ludo Deferm (1.IMEC)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-2-1] Selective Nucleation Based Epitaxy(SENTAXY): A Novel Approach for Thin Film Formation

Hideya KUMOMI, Takao YONEHARA (1.Canon Inc., Device Development Center)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-2-2] Deposition and Characterization of Silicon-Germanium Alloy Thin Films on Oxide

Rafael Reif (1.Microsystems Technology Laboratories Massachusetts Institute of Technology)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-2-3] Low Temperature Epitaxy of Si and SiGe by the Novel Centrifugal LPE Technique

Mitsuharu KONUMA (1.Max-Planck-Institut fur Festkorperforschung Max-Planck-Institut fur Metallforschung)

1996 International Conference on Solid State Devices and Materials |PDF Download

[B-2-4] A Proposed Atomic-Layer-Deposition of Germanium on Si(100)

Takuya KITAMURA, Satoshi SUGAHARA, Tomonori NAGAI, Yasutaka UCHIDA, Masakiyo MATSUMURA (1.Department of Physical Electronics, Tokyo Institute of Technology, 2.Department of Electronics and Information Science, Teikyo University of Science and Technology)

1996 International Conference on Solid State Devices and Materials |PDF Download

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